1997
DOI: 10.1016/s0040-6090(96)09458-8
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The effect of rapid thermal annealing on structural and electrical properties of TiB2 thin films

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Cited by 32 publications
(11 citation statements)
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“…According to Todorovic et al 2 and Kryshtab et al, 3 the combination of these properties point to the use of TiB 2 thin films in wear, abrasion and oxidationresistance applications. Titanium Diboride (TiB 2 ) is a wellknown ceramic material presenting very high hardness (∼30 GPa), high wear and corrosion resistance, good thermal and electric conductivities, excellent chemical 6 Several methods have been used to deposit TiB 2 films, like DC magnetron sputtering, DC magnetron triode, RF sputtering, chemical vapour deposition, and pulsed laser deposition.…”
Section: Introductionmentioning
confidence: 99%
“…According to Todorovic et al 2 and Kryshtab et al, 3 the combination of these properties point to the use of TiB 2 thin films in wear, abrasion and oxidationresistance applications. Titanium Diboride (TiB 2 ) is a wellknown ceramic material presenting very high hardness (∼30 GPa), high wear and corrosion resistance, good thermal and electric conductivities, excellent chemical 6 Several methods have been used to deposit TiB 2 films, like DC magnetron sputtering, DC magnetron triode, RF sputtering, chemical vapour deposition, and pulsed laser deposition.…”
Section: Introductionmentioning
confidence: 99%
“…There have been increasing interests in fabrication of this material in thin film and coating forms for many potential applications, for example to reduce wear and corrosion in engineering components and particularly in material processing tools and dies [1][2][3][4][5]. Among the many coating deposition techniques employed so far, non-reactive sputtering from a TiB 2 target is the most widely used for TiB 2 coating fabrication [4 -7].…”
Section: Introductionmentioning
confidence: 99%
“…A further major problem is that TiB 2 coatings are very brittle and usually have poor adhesion with metallic substrates, which is the main barrier for the industrial application of TiB 2 coatings. Recently, several attempts have been made to overcome these problems, for example by sputter cleaning the substrate [12], applying substrate bias during deposition [7,10], annealing after deposition [3,4], forming multilayer and composite coatings [11 -13] and introducing nitrogen during deposition [14,15].…”
Section: Introductionmentioning
confidence: 99%
“…1) Among the many coating deposition techniques employed so far, non-reactive sputtering from a TiB 2 target is the most widely used for TiB 2 coating fabrication. 2) Although the structures and properties of sputter-deposited TiB 2 coatings have been studied by many investigators in recent years, 3,4) the commercialization of sputtered TiB 2 coatings has been hindered mainly due to the poor adhesion of the coating to the substrate. Indeed, for the coating systems, adhesion or coating adhesion to substrate is certainly the first attribute that a film must possess before any of its other properties can be exploited or achieved.…”
Section: Introductionmentioning
confidence: 99%