2011
DOI: 10.1016/j.jallcom.2011.03.019
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The effect of substrate bias voltage on PbTe films deposited by magnetron sputtering

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Cited by 10 publications
(2 citation statements)
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“…Thin films of lead chalcogenide especially PbSe have been fabricated by several methods with ease and simplicity, which includes thermal evaporation technique, chemical vapour deposition, molecular beam epitaxy, electron beam evaporation, sputtering evaporation, pulsed laser ablation, flash evaporation and chemical bath evaporation [11][12][13][14][15][16][17][18]. Each method has its own features and limitations.…”
Section: Introductionmentioning
confidence: 99%
“…Thin films of lead chalcogenide especially PbSe have been fabricated by several methods with ease and simplicity, which includes thermal evaporation technique, chemical vapour deposition, molecular beam epitaxy, electron beam evaporation, sputtering evaporation, pulsed laser ablation, flash evaporation and chemical bath evaporation [11][12][13][14][15][16][17][18]. Each method has its own features and limitations.…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, there is currently a developing demand of thin thermoelectric film devices with an efficient cooling capacity, small area, and short response time. Many techniques have been developed for the preparation of PbTe films, including chemical vapor deposition [21], molecular beam epitaxy [22], hot-wall epitaxy [23], magnetron sputtering [24], and PLD [25][26][27]. Pulsed laser deposition (PLD), specifically, has becoming a powerful technique for fabricating also high-quality thermoelectric films, in addition to other technologically relevant materials, mainly owing to its operational simplicity and the unique ability of an almost stoichiometric mass transfer from the target to the substrate, in vacuum or in a convenient gas atmosphere.…”
Section: Introductionmentioning
confidence: 99%