1972
DOI: 10.1016/0040-6090(72)90279-9
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The effect of substrate orientation on the structure of epitaxial films of II–VI compounds

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Cited by 18 publications
(5 citation statements)
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“…CdSe films deposited in vacuum on unheated glass substrates consist mostly of the hexagonal phase [7]. On smooth amorphous substrates at room temperature or up to about 373 K the cubic structure tends to be formed partly, while the hexagonal structure is in general increasingly developed at higher temperatures [8]. This dominant orientation in the (002) direction has already been reported [9] on sprayed CdSe also.…”
supporting
confidence: 54%
“…CdSe films deposited in vacuum on unheated glass substrates consist mostly of the hexagonal phase [7]. On smooth amorphous substrates at room temperature or up to about 373 K the cubic structure tends to be formed partly, while the hexagonal structure is in general increasingly developed at higher temperatures [8]. This dominant orientation in the (002) direction has already been reported [9] on sprayed CdSe also.…”
supporting
confidence: 54%
“…In many other experiments on the epitaxial orientation of these materials on mica, NaC1, etc (e.g. reviewed by Holt and Wilcox 1971), thin films condensed at 20" to 100°C were also often random-polycrystalline and epitaxy was only seen at higher temperatures.…”
Section: Introdiictionmentioning
confidence: 98%
“…(See e.g. reviews of film growth of II-VI materials by Ray (1969) and Holt and Wilcox (1971). For particular reference to CdS see Addiss (1962), Dresner and Shallcross (1963), Shalimova et aZ (1964), Shallcross (1966), Foster (1967), Meirsschaut (1971), for CdSe see Kubovy et a1 (1969), Dhere and Goswami (1969), Svechnicov et a1 (1972), Snejdar and Jerhot (1972) and Dhere et aZ(1977), and for CdTe see Goldstein and Pensak (1959), Semiletov (1962), Kamiyama et aZ(1962), Glang et aZ(1963), Shalimova et a1 (1966) and Matsumo and Tnoue (1967)) Increased substrate temperature was also found to lead to larger crystals and increased deposition rate to increase the degree of imperfection in the films.…”
Section: Introdiictionmentioning
confidence: 99%
“…sin a --]gdif~] tan 0 dl or sinai_ ( dl --df ) tan 0 [5] In the present case within experimental error, e ----30 ~ Calculating the spacings of the 022 planes in CdSe and Ge using the expression dhkl : a/(h 2 -~ k 2 ~-le) 1/2 where the lattice parameters, a, for CdSe and Ge are 6.077A and 5.658A, respectively, and substituting into Eq. [5] gives ~ ----2024 '.…”
Section: ~000mentioning
confidence: 99%
“…sin a --]gdif~] tan 0 dl or sinai_ ( dl --df ) tan 0 [5] In the present case within experimental error, e ----30 ~ Calculating the spacings of the 022 planes in CdSe and Ge using the expression dhkl : a/(h 2 -~ k 2 ~-le) 1/2 where the lattice parameters, a, for CdSe and Ge are 6.077A and 5.658A, respectively, and substituting into Eq. [5] gives ~ ----2024 '. This angle does not appear to have any simple crystallographic significance, despite the crystallographic appearance of the ,-~ 30 ~ angle of rotation of the Moire spot arrays from their positions in a parallel epitaxial alignment pattern.…”
Section: ~000mentioning
confidence: 99%