The effect of substrate temperature on the microstructural properties of nanocrystalline tin oxide coatings produced by APCVD

Abstract

Tin oxide thin films were grown by chemical vapor deposition on glass substrates at atmospheric pressure and temperatures of 400, 500, and 600°C over deposition times from 15 to 60 min with 15-min intervals to investigate the effect of deposition time. A homemade horizontal reactor was used for deposition from SnCl 2 + 2H 2 O precursors with pure oxygen flowing at a rate of 5 ccpm. The structure was analyzed by X-ray diffraction (XRD), scanning electron microscopy, and atomic force microscopy techniques to reveal the deposition mechanisms and crystalline structures. XRD analysis showed that the predominant phase in all experimental conditions was SnO 2 . From the XRD analysis, it is understood that the preferred orientation of the SnO 2 films is dependent on their thickness, which is affected by deposition time and substrate temperature.

An economic CVD technique for pure SnO 2 thin films deposition: Temperature effects

“…At 500 • C, small flakes are observed which grew into well-faceted tiny crystals. This is in accordance with the results of Karshoglu et al (2010).…”

Enhanced transparent-conducting fluorine-doped tin oxide films formed by Aerosol-Assisted Chemical Vapour Deposition

“…Correspondingly for the oxygen-rich carrier gas conditions; once nucleated, air provides more favourable growth conditions for the metal oxide crystallites than does N 2 . 42,43 Therefore, it is unsurprising that PrOH carrier solvent generally yielded the largest average crystallite sizes under all experimental conditions whilst acetone gave the smallest.…”

The effect of substrate temperature on the electrical and optic properties of nanocrystalline tin oxide coatings produced by APCVD

“…This idea was confirmed from XRD result. More detailed XRD results can be found in our previous study [16]. These two kinds of phases, however, differed in the stability of the electrical properties.…”

“…1 shows three different scanning electron microscopy micrographs of deposited films as representatives. The detailed microstructural features of the produced thin films were presented in our previous work [16]. For brevity, only the coatings that were deposited at 400, 500 and 600 1C for 15 min were presented with their cross-sectional micrographs.…”

“…The CVD apparatus used in this experiment is a horizontal hot-wall APCVD system and structural properties were described in a previous work [16].…”