2015
DOI: 10.1016/j.ceramint.2014.08.060
|View full text |Cite
|
Sign up to set email alerts
|

The effect of temperature on the growth and properties of chemical vapor deposited ZrC films on SiC-coated graphite substrates

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
7
0

Year Published

2015
2015
2023
2023

Publication Types

Select...
7
1

Relationship

0
8

Authors

Journals

citations
Cited by 18 publications
(9 citation statements)
references
References 21 publications
0
7
0
Order By: Relevance
“…Due to its high melting point, high hardness/modulus and good oxidation/ablation performances, ZrC is a promising material used in high temperature extreme environment. The synthesis methods of ZrCNWs mainly include chemical vapor decomposition (CVD), 22 precursor infiltration and pyrolysis (PIP), 23 carbothermal reduction, 18 microwave hydrothermal processing 24 . ZrCNWs synthesized by these methods are mainly hampered by the following aspects.…”
Section: Introductionmentioning
confidence: 99%
“…Due to its high melting point, high hardness/modulus and good oxidation/ablation performances, ZrC is a promising material used in high temperature extreme environment. The synthesis methods of ZrCNWs mainly include chemical vapor decomposition (CVD), 22 precursor infiltration and pyrolysis (PIP), 23 carbothermal reduction, 18 microwave hydrothermal processing 24 . ZrCNWs synthesized by these methods are mainly hampered by the following aspects.…”
Section: Introductionmentioning
confidence: 99%
“…Below 1100 o C, it seems that the carbon atoms in the coating layer gains insufficient energy to diffuse into zircaloy surface for the formation of carbide phase. By CVD process, on the other hand, ZrC phase is obtained at the temperatures in the range of 1000 o C to 1300 o C [9][10] .…”
Section: Resultsmentioning
confidence: 99%
“…It is used in some hi-tech areas such as coating layer of High Temperature Gas-cooled Reactor (HTGR) nuclear fuel [9][10] , used in aerospace industry and coating of fire line shell in all the longrange missiles [10] . Based on ZrC phase diagram in Figure 1 and yield of ZrC deposition in Figure 2 show that ZrC film will be formed at temperature ranging of 500 o C to 3500 o C [11][12] .…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Popular precursors for the CVD growth of ZrC are ZrCl 4 and CH 4 in the presence of hydrogen and argon, also used in this study. During the CVD growth of ZrC, there are often inclusions of free carbon [35] in the form of turbostratic carbon, i.e. highly disordered graphite [6].…”
Section: Introductionmentioning
confidence: 99%