Defect structure and electrophysical parameters of GaAs implanted with C+, Ne+, Ar+, C+ +Ne+, and C+ + Ar+ ions are studied by means of electron microscopy and Hall measurements. The results are explained in terms of the hypothesis according to which an increase in the irradiation dose results in a change of the dominating process which causes nonstoichiometry in subsurface regions. At doses below the threshold dose such regions are enriched with As. at those above it with Ga.