2016
DOI: 10.1039/c6ra21858j
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The effect of the surface energy and structure of the SiC substrate on epitaxial graphene growth

Abstract: The theoretical calculations and experiments were employed to study the effect of the exposed SiC surface on epitaxial graphene growth.

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Cited by 18 publications
(12 citation statements)
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“…5(d). These results indicate that the buffer layer appears in sample B rather than sample A4, 32,33 which is also in line with the XPS results.…”
Section: Resultssupporting
confidence: 89%
“…5(d). These results indicate that the buffer layer appears in sample B rather than sample A4, 32,33 which is also in line with the XPS results.…”
Section: Resultssupporting
confidence: 89%
“…Where is the unstable stacking fault energy, s is the surface energy can be calculated as below [47]:…”
Section: Effect Of Graphene On Stacking Fault Energy Of Pure Cumentioning
confidence: 99%
“…The Wulff’s theorem notes that the thermodynamically controlled crystal growth process tends to minimize the total surface free energy of the crystal; therefore, the growth rate of a certain facet is proportional to its surface free energy per unit area (eV/Å 2 ) . This means that the facet with higher surface energy possesses a faster growth rate, which would cause the gradual disappearance of this facet during the growth procedure, leading to the reduced proportion of this facet in the final crystal . It has been well-established that the presence of a capping agent can preferentially interact with a specific facet of a crystal, and the order of the surface energies of different facets could also be changed. , In our case, because the increased AA concentration is observed to lead to morphology variation of the PbI 2 crystal, it is reasonable to hypothesize that the hydrogen (H) atom might function as a capping agent and change the surface energy of the PbI 2 crystal.…”
mentioning
confidence: 99%