2006
DOI: 10.1109/tsm.2006.883591
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The Effect of Thermal Shocks on the Stresses in a Sapphire Wafer

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Cited by 11 publications
(4 citation statements)
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“…The boundary conditions adopted here are similar to those previously used by the authors [22,23]: the single wafer is considered in thermal equilibrium with the surrounding wafers; the wafer is subjected to radiation on its edges while under high environmental temperature, but subjected to convection on the edges while at low room temperature; the environmental temperature is transferred from the edges through the wafer by heat conduction. Transient heat transfer analysis leads to the same temperature distribution for the anisotropic sapphire wafer, as for the isotropic sapphire wafer [22] because the sapphire thermal properties are not directional dependent, e.g., Figs.…”
Section: Heat Transfermentioning
confidence: 99%
“…The boundary conditions adopted here are similar to those previously used by the authors [22,23]: the single wafer is considered in thermal equilibrium with the surrounding wafers; the wafer is subjected to radiation on its edges while under high environmental temperature, but subjected to convection on the edges while at low room temperature; the environmental temperature is transferred from the edges through the wafer by heat conduction. Transient heat transfer analysis leads to the same temperature distribution for the anisotropic sapphire wafer, as for the isotropic sapphire wafer [22] because the sapphire thermal properties are not directional dependent, e.g., Figs.…”
Section: Heat Transfermentioning
confidence: 99%
“…The thermal expansion coefficient is linearly related to temperature, as shown in figure 7. It is close to the thermal expansion coefficient of the sapphire wafer described in [28]. To evaluate the stability of the sensor, we recorded the cavity length for 200 min at the room temperature point with a time interval of 1 min, and the measurement results are shown in figure 9.…”
Section: Resultsmentioning
confidence: 64%
“…One of the reasons is the rapid temperature variation during heating and/or cooling, which can increase mechanical stresses within the wafer due to the wafer thermal inertia and phase shift which generate a thermal gradient across the entire 6‐inch wafer. [ 25 ] Good crystalline quality h‐BN needs to be grown at high temperature (1280 °C in our case), n‐GaN ≈1100 °C and InGaN ≈700 °C, so for 6‐inch wafers the effect of temperature changes between h‐BN growth and subsequent layer growth are more pronounced. Another reason is the switch of carrier gases, between hydrogen (H 2 ) with high thermal conductivity (482 mW mK −1 at 700 °C [ 26 ] ) and nitrogen (N 2 ) with low thermal conductivity (64 mW mK −1 at 700 °C [ 27 ] ), used for the growth of different layers of GaN‐based LED heterostructures on h‐BN, which causes a sudden change of surface temperature of the wafer and hence a thermal shock.…”
Section: Resultsmentioning
confidence: 99%