“…Mg:ZnO thin films could be grown on Al 2 O 3 (0001) substrates due to good lattice match between the (002) plane of hexagonal Mg:ZnO and (0006) plane of Al 2 O 3 . Several deposition techniques have been developed for the preparation of Mg doped ZnO thin films (Chen and Yu, ; Park et al, ; Ravichandran et al, ). In the present study, direct current (dc) magnetron sputtering have been used for fabrication of pure ZnO and Mg doped ZnO thin films for its advantages: low substrate temperature (down to room temperature), good adhesion, high deposition rates, good thickness uniformity and high density, good controllability, and long‐term stability of the process (Shin et al, ).…”