1991
DOI: 10.1016/0040-6090(91)90004-h
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The effects of zinc diffusion on the electrical and optical properties of ZnO:Al films prepared by r.f. reactive sputtering

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Cited by 83 publications
(27 citation statements)
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“…The interference fringes of the reflection spectrum shows behaviour opposite to those in the transmission spectum. However, the typical reflectance spectrum pattern is characterized by maxima and minma [14,15].…”
Section: Resultsmentioning
confidence: 99%
“…The interference fringes of the reflection spectrum shows behaviour opposite to those in the transmission spectum. However, the typical reflectance spectrum pattern is characterized by maxima and minma [14,15].…”
Section: Resultsmentioning
confidence: 99%
“…It is also found in Figure 3 that the resistivity of the BGZO films decrease gradually with increasing of sputtering pressure up to 6mTorr. As reported, the resistivity of the films is dominated by the carrier concentration and mobility as the following equation [15]: ȡ=1/Nɟμ, where, ȡ is resistivity, N is carrier concentration and μ is mobility. From the equation, the increased carrier concentration and mobility of BGZO films is the reason for decreased film resistivity with sputtering pressure in the 3-6 mTorr range.…”
Section: Resultsmentioning
confidence: 99%
“…As previously reported, Al doped ZnO (ZnO:Al) thin films show good transparent and conducting properties whose resistivity has achieved the order of 1 Â 10 À4 V cm with average transparency of more than 85% in visible regions [6][7][8]. Despite of the superior properties of ZnO:Al as a replacement for TCO, it shows relatively low thermal stability and degeneration problem in long time exposure to air ambient originated from high reactivity of aluminum [9,10].…”
Section: Introductionmentioning
confidence: 86%