The efficacy ofBeauveria bassiana,jasmonic acid and chlorantraniliprole on larval populations ofHelicoverpa armigerain chickpea crop ecosystems

Abstract

The results suggest that B. bassiana, jasmonic acid and chlorantraniliprole may be useful components for the H. armigera IPM strategy. © 2016 Society of Chemical Industry.

Overexpression of cytochrome P450 CYP6BG1 may contribute to chlorantraniliprole resistance in Plutella xylostella (L.)

“…However, high levels of chlorantraniliprole resistance in DBM are reported in China, Thailand, the Philippines and Brazil . Despite this developing resistance, chlorantraniliprole and other diamide insecticides continue to play a very important role in the management of P. xylostella and other pest insects worldwide . Therefore, the mechanisms of resistance of DBM to chlorantraniliprole must be clearly understood.…”

Functional Analysis of the Chemosensory Protein MsepCSP8 From the Oriental Armyworm Mythimna separata

“…Recent outbreaks of M. separata have been observed in several regions of China, especially Jilin, Hebei, Heilongjiang, Liaoning, and Shanxi, and this organism poses a severe threat to corn production ( Yun et al, 2017 ). In an attempt to restrict crop damage by M. separata , high doses of synthetic insecticides are often applied ( Liu Y. et al, 2016 ), but this causes serious environmental problems and cropland deterioration, stimulates insect resistance, and has a negative impact on non-target organisms ( Younas et al, 2016 ). Population outbreaks of M. separata present a great challenge in terms of protecting crops worldwide ( Liu et al, 2017 ).…”

Over-expression of UDP-glycosyltransferase geneUGT2B17is involved in chlorantraniliprole resistance inPlutella xylostella(L.)

“…Despite this, chlorantraniliprole and other diamide insecticides, such as flubendiamide and cyantraniliprole, remain very important for the management of P. xylostella and other pest insects worldwide . To make good use of these novel insecticides and increase their service life, an in‐depth understanding of resistance mechanisms is necessary.…”