The electric field modulation by lateral crack coated with HfO2/SiO2 high reflector

Li, Li; Zhang, Chunlai; Yang, Cheng-Fei; Zu, Xiaotao

doi:10.1016/j.ijleo.2014.03.015

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电磁波时域有限差分(Fdtd)方法能够体现激光1

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Cited by 2 publications

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“…用FDTD方法研究强激光和材料的相互作用, 已有多篇报道 [8~10] . 作者也曾对连续划痕 [11] 、断点划痕 [4,12] 、损伤修复斑 [6] 以及缺陷膜层 [13] (2) 9] , 差分网格尺寸δ=λ/12, 时间步长Δt=δ/2C(C为真空光速), 可满足Courant稳定性条件 [7] . 采用Berenger的完全匹配层(PML)吸收性边界条件, PML层厚度为9δ [7] .…”

Section: 电磁波时域有限差分(Fdtd)方法能够体现激光unclassified

Laser irradiation effects of non-continuous scratch on substrate of thin film optical device

Zhang¹,

Yao²

2017

Sci. Sin.-Tech.

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Section: 电磁波时域有限差分(Fdtd)方法能够体现激光unclassified

Laser irradiation effects of non-continuous scratch on substrate of thin film optical device

Zhang¹,

Yao²

2017

Sci. Sin.-Tech.

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INFLUENCE OF DEPOSITION TEMPERATURE ON OPTICAL AND LASER-INDUCED DAMAGE PROPERTIES OF LaTiO₃ FILMS

Yang

et al. 2015

Surf. Rev. Lett.

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LaTiO 3 films were prepared at room temperature, 60, 140 and 220°C using a thermal vapor deposition technique with an electronic beam gun to investigate the relationship between deposition temperatures and the optical properties of the samples. In the ellipsometric analysis, the corresponding refractive indexes were 1.8993, 1.9123, 1.9197 and 1.9283 at a wavelength of 1064 nm. At the same time, extremely low absorption characteristics of all the samples presented in the visible and IR regions. With the same high-energy testing laser of 200 mJ (about 40 J/cm2) at a wavelength of 1064 nm and a pulse width of 10 ns, the laser-induced damage threshold (LIDT) of the LaTiO 3 samples prepared at different temperatures were 15.5, 16.7, 18.5 and 18.2 J/cm2, respectively. This shows that a higher LIDT may be obtained at higher deposition temperatures.

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The electric field modulation by lateral crack coated with HfO2/SiO2 high reflector

Cited by 2 publications

References 16 publications

Laser irradiation effects of non-continuous scratch on substrate of thin film optical device

Laser irradiation effects of non-continuous scratch on substrate of thin film optical device

INFLUENCE OF DEPOSITION TEMPERATURE ON OPTICAL AND LASER-INDUCED DAMAGE PROPERTIES OF LaTiO₃ FILMS

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The electric field modulation by lateral crack coated with HfO2/SiO2 high reflector

Cited by 2 publications

References 16 publications

Laser irradiation effects of non-continuous scratch on substrate of thin film optical device

Laser irradiation effects of non-continuous scratch on substrate of thin film optical device

INFLUENCE OF DEPOSITION TEMPERATURE ON OPTICAL AND LASER-INDUCED DAMAGE PROPERTIES OF LaTiO3 FILMS

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Product

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About

INFLUENCE OF DEPOSITION TEMPERATURE ON OPTICAL AND LASER-INDUCED DAMAGE PROPERTIES OF LaTiO₃ FILMS