2013
DOI: 10.1039/c3ra40823j
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The electrical and microstructural properties of electroplated screen-printed Ag metal contacts in crystalline silicon solar cells

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Cited by 19 publications
(10 citation statements)
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“…In addition to application of electroless plating for deposition of seed Ni layer, photoassisted electroless Ag plating over screen-printed Ag seed layer has been demonstrated to decrease the and leading to absolute improvement in FF by 2 to 8% [55,56]. The improvement in FF is due to filling up of micropores and voids in the screen-printed contacts with plated Ag [55]. Commercially manufactured cells with noncontinuous contact grids or high were also found to improve after electroless Ag plating with absolute efficiency gain of 0.2% to 1.8% [56,57].…”
Section: Electroless Ag Plating For Solar Cell Metallizationmentioning
confidence: 99%
“…In addition to application of electroless plating for deposition of seed Ni layer, photoassisted electroless Ag plating over screen-printed Ag seed layer has been demonstrated to decrease the and leading to absolute improvement in FF by 2 to 8% [55,56]. The improvement in FF is due to filling up of micropores and voids in the screen-printed contacts with plated Ag [55]. Commercially manufactured cells with noncontinuous contact grids or high were also found to improve after electroless Ag plating with absolute efficiency gain of 0.2% to 1.8% [56,57].…”
Section: Electroless Ag Plating For Solar Cell Metallizationmentioning
confidence: 99%
“…Electroless deposition is a chemical method to provide silver atoms and small clusters in solution. 45,46 The silver tracks were immerged into the electroless deposition solution aer sintering process as illustrated in Fig. 3a.…”
Section: Resultsmentioning
confidence: 99%
“…Method B is a modified TLM with four-point probes, 16 where the first two probes for voltage high and current high, respectively, are anchored at the first electrode and the other two probes for voltage low and current low, respectively, move together sequentially from the second to the last silver electrode. Method C is the TPP method, [17][18][19] where the first two probes of voltage high and current high, respectively, are anchored at the first silver electrode, the third probe for current low is anchored at the last silver electrode, and the last probe for voltage low moves sequentially from the second to the last silver electrode. Fig.…”
Section: The Influence Of Measuring Methods and Conditions On Resistamentioning
confidence: 99%
“…For the characterization of the contact resistivity of silver electrodes, diverse resistance measurement methods, such as the circular transmission line method (the circular transfer length method and abbreviated as CTLM), [12][13][14] the linear transmission line method (the transfer length method and abbreviated as TLM), 15,16 and the threepoint probe (TPP) method [17][18][19] have been introduced. In general, a specimen for CTLM or TLM requires either a set of concentric circular silver electrodes with different gaps or a set of linear silver electrodes with different spacings, respectively.…”
Section: 11mentioning
confidence: 99%