2012
DOI: 10.1016/j.mee.2012.06.001
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The experimental investigation on dark current for InGaAs–InP avalanche photodiodes

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Cited by 12 publications
(4 citation statements)
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“…Generally, a higher reverse bias voltage causes a larger electric field in a conventional PD. Compared with the InP collector, the larger electric field generated by the InAlAs collector indicates that the InAlAs UTC-PD satisfies the requirements of a large critical voltage [30] and low dark current at a low bias for the avalanche effect. Furthermore, the electric field of the InAlAs UTC-PD showed a "zero-high profile" in the absorption-collector region, which is similar to the "low-high profile" in the absorption-multiplication region in the APD.…”
Section: Design and Fabricationmentioning
confidence: 99%
“…Generally, a higher reverse bias voltage causes a larger electric field in a conventional PD. Compared with the InP collector, the larger electric field generated by the InAlAs collector indicates that the InAlAs UTC-PD satisfies the requirements of a large critical voltage [30] and low dark current at a low bias for the avalanche effect. Furthermore, the electric field of the InAlAs UTC-PD showed a "zero-high profile" in the absorption-collector region, which is similar to the "low-high profile" in the absorption-multiplication region in the APD.…”
Section: Design and Fabricationmentioning
confidence: 99%
“…Table 3 presents SWIR [ 27 , 28 , 29 , 30 , 31 , 32 , 33 , 34 , 35 , 36 , 37 , 38 , 39 , 40 , 41 , 42 , 43 , 44 ], MWIR [ 45 , 46 , 47 , 48 , 49 , 50 ] (PIN, SAM and SACM) state-of-art and LWIR, λ ~ 8 μm (230 K) HgCdTe SAM APDs based devices to include maximum gain ( M ), impact ionization ratio ( k ), excess noise factor F ( M ) and dark current mostly at M = 10. As presented, the majority of the published papers corresponds to the T = 300 K and SWIR range.…”
Section: Comparison Of λ ~ 8 μM (230 K) Hgcdte Ver...mentioning
confidence: 99%
“…Near-infrared InGaAs/InP avalanche photodiodes (APDs) are key devices in the fields of communication, lidar and others [1][2][3][4] . The structure with separated absorption, grade, charge and multiplication (SAGCM) and using InGaAs/InP APD epitaxial material, which can be mass-produced by metalorganic chemical vapor deposition (MOCVD), has been widely applied.…”
Section: Introductionmentioning
confidence: 99%