2013
DOI: 10.7498/aps.62.205207
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The full three-dimensional electromagnetic PIC/MCC numerical algorithm research of Penning ion source discharge

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“…This non-uniformity is rooted in the non-uniformity of the H atoms caused by the non-uniformity of electrons. [3,4] H − is produced when H atoms bombard the plasma grid. Based on the above analysis, a systematic research on the electron deposition process in the JAEA 10 A ion source is carried out by using particle-in-cell/Monte Carlo collision (PIC/MCC) simulations based on a full three-dimension and self-developed code.…”
Section: Introductionmentioning
confidence: 99%
“…This non-uniformity is rooted in the non-uniformity of the H atoms caused by the non-uniformity of electrons. [3,4] H − is produced when H atoms bombard the plasma grid. Based on the above analysis, a systematic research on the electron deposition process in the JAEA 10 A ion source is carried out by using particle-in-cell/Monte Carlo collision (PIC/MCC) simulations based on a full three-dimension and self-developed code.…”
Section: Introductionmentioning
confidence: 99%