The Future of Lithography: SEMATECH Litho Forum 2008

Willson, C. Grant; Roman, Bernard J.

doi:10.1021/nn800410c

Cited by 51 publications

(64 citation statements)

References 2 publications

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“…Mastering is a time-intensive and expensive process, and may require twenty hours to produce a single mask. [10] Replication of this pattern takes the form of photolithography, in which light passes through the photomask and creates an image on a wafer coated with a film of a light-sensitive polymer called a photoresist. Modern exposure tools generate around 100 copies min -1 .…”

Section: Nanofabricationmentioning

confidence: 99%

“…Modern exposure tools generate around 100 copies min -1 . [10] After chemical processing, the surface of the material comprising the wafer can be modified in the areas of the film unprotected by photoresist (e.g., by etching, vapor deposition, ion implantation, or other processes). Iteration of these processes generates the devices and connections on a chip.…”

Section: Nanofabricationmentioning

confidence: 99%

“…[17] Next-generation lithographic tools, including extreme ultraviolet lithography (EUVL), [18] maskless lithography (ML2, which would use thousands of electron beams to replicate patterns without the need for a physical master), [19] and step-and-flash imprint lithography (SFIL) [20] are expected to drive the average half-pitch down to 16 nm by 2019, according to the International Technical Roadmap for Semiconductors. [10] Informed speculation suggests an ultimate limit that may be as small as 8 nm.…”

Section: Nanofabricationmentioning

confidence: 99%

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Use of Thin Sectioning (Nanoskiving) to Fabricate Nanostructures for Electronic and Optical Applications

2011

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Lead-InThis paper reviews nanoskiving-a simple and inexpensive method of nanofabrication, which minimizes requirements for access to cleanrooms and associated facilities, and which make it possible to fabricate nanostructures from materials, and of geometries, to which more familiar methods of nanofabrication are not applicable. Nanoskiving requires three steps: i) deposition of a metallic, semiconducting, ceramic, or polymeric thin film onto an epoxy substrate; ii) embedding this film in epoxy, to form an epoxy block, with the film as an inclusion; and iii) sectioning the epoxy block into slabs with an ultramicrotome. These slabs, which can be 30 nm -10 µm thick, contain nanostructures whose lateral dimensions are equal to the thicknesses of the embedded thin films. Electronic applications of structures produced by this method include nanoelectrodes for electrochemistry, chemoresistive nanowires, and 4 heterostructures of organic semiconductors. Optical applications include surface plasmon resonators, plasmonic waveguides, and frequency-selective surfaces.

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Section: Nanofabricationmentioning

confidence: 99%

Section: Nanofabricationmentioning

confidence: 99%

Section: Nanofabricationmentioning

confidence: 99%

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Use of Thin Sectioning (Nanoskiving) to Fabricate Nanostructures for Electronic and Optical Applications

2011

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“…1 While "smaller, faster, cheaper" has become a mantra for the semiconductor industry and has motivated further development of established nanofabrication tools and methods, new capabilities are being enabled by chemical methods of nanofabrication and the resulting creation of nanoscale chemical patterns. 2Ϫ9 Likewise, a plethora of clever alternative methods for patterning at the nanoscale are being developed.…”

mentioning

confidence: 99%

Different and More Powerful, Not Just Smaller, Faster, Cheaper

2009

ACS Nano

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A major driving force behind the development of new tools and techniques in nanoscience has been the ability to produce electronic devices and circuits with smaller dimensions, faster processing times, and cheaper production costs. 1 While "smaller, faster, cheaper" has become a mantra for the semiconductor industry and has motivated further development of established nanofabrication tools and methods, new capabilities are being enabled by chemical methods of nanofabrication and the resulting creation of nanoscale chemical patterns. 2Ϫ9 Likewise, a plethora of clever alternative methods for patterning at the nanoscale are being developed. 1,2 These creative methods are being used in areas far beyond device electronics, encompassing chemical, biological, medical, and other applications.

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“…9,10 With 12 issues in print and so much more to come, we reflect back on the past year, and as always, keep an eye to the future.…”

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confidence: 99%

Our Paper Anniversary

Weiss¹,

Bonnell²,

Hammond³

et al. 2008

ACS Nano

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A year has passed since ACS Nano published its first issue and, as with any milestone, it is a natural time for reflection. Our first year has been filled with extraordinary science from our authors, thoughtful discourse with leaders in the field, and forward-looking perspectives on many of the significant topics in our area. We have seen the true multidisciplinary nature of nanoscience by covering far-reaching areas of research, from developing nanomaterials for RNAi delivery 1,2 to computational analyses of singlemolecule electronics. 3 We have had dialogues with pioneers who originated new branches of nanoscience and with international giants and leaders in our field. 4Ϫ7 We have published commentary about key issues, such as the environmental impacts of nanoscience 8 and the emerging technologies that will augment current lithographic techniques.9,10 With 12 issues in print and so much more to come, we reflect back on the past year, and as always, keep an eye to the future.ACS Nano was launched to provide a forum for high-impact and comprehensive articles, perspectives, and reviews in nanoscience and nanotechnology. One of the most common questions we were asked in the months leading up to our first issue was whether there was a need for another journal in this subject area, and we have been gratified and delighted to see that your answer to that question has been a resounding yes! Each month we receive more high-quality manuscript submissions, corresponding to a steady increase in our peer-reviewed content. Our reviewers play a vital role in the quality of our published papers, and we have been delighted by and grateful for their efforts to ensure our authors are given timely, thoughtful, and insightful reviews. Since launching last August, we have also added to our Editorial Advisory Board, welcoming two new membersOProf. A. Paul Alivisatos and Prof. Flemming Besenbacher. They and the other Board members have been an invaluable source of ideas, support, and wisdom for the journal. We are very thankful to have so many of our esteemed peers working to make ACS Nano a success.Over the past year we have achieved many milestones. Two significant indicators of our success was our selection as one of four finalists for the Association of Learned and Professional Society Publishers Award for Best New Journal (with the winner to be determined this fall) and the indexing of all our journal content by Thomson Reuters (ISI). We have had other intangible successes as well; especially satisfying is the feedback that we receive from you, our community. We have been overwhelmed by the favorable comments from our readers, authors, and reviewers. There are many reasons to celebrate.With these accomplishments in hand, we are excited to build on our first year and have many plans to do even more. The upcoming year will be an important one for nanoscience. At the 237th American Chemical Society National Meeting in March 2009 (in Salt Lake City, Utah), the theme will be "Nanoscience: Challenges for the Future". ACS Nano will b...

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The Future of Lithography: SEMATECH Litho Forum 2008

Cited by 51 publications

References 2 publications

Use of Thin Sectioning (Nanoskiving) to Fabricate Nanostructures for Electronic and Optical Applications

Use of Thin Sectioning (Nanoskiving) to Fabricate Nanostructures for Electronic and Optical Applications

Different and More Powerful, Not Just Smaller, Faster, Cheaper

Our Paper Anniversary

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