2019
DOI: 10.1134/s1063782619040092
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The Growth of InAsxSb1 –x Solid Solutions on Misoriented GaAs(001) Substrates by Molecular-Beam Epitaxy

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Cited by 3 publications
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“…Most commonly, the angles of the layer orientation rotation in relation to the substrate along the growth direction during the HES growth are experimentally measured by the X-ray diffraction method. The rotation of the orientation plane along the growth direction is observed when growing the heterosystems based on the various semiconductors [15][16][17][18][19][20][21][22]. For the MBE MCT HES'es on the (112)CdZnTe substrate, there was evidently the rotation of the orientation plane to 100 ang.…”
Section: Introductionmentioning
confidence: 99%
“…Most commonly, the angles of the layer orientation rotation in relation to the substrate along the growth direction during the HES growth are experimentally measured by the X-ray diffraction method. The rotation of the orientation plane along the growth direction is observed when growing the heterosystems based on the various semiconductors [15][16][17][18][19][20][21][22]. For the MBE MCT HES'es on the (112)CdZnTe substrate, there was evidently the rotation of the orientation plane to 100 ang.…”
Section: Introductionmentioning
confidence: 99%