The crystalline silicon (c-Si) maintains its leading position as an important marketing product with an efficiency conversion projection of 28% by 2050. High purity semiconductor films commit 50% of a photovoltaic cell cost and improvements in their production processes is the key to reducing costs. Moreover, the industry of III Congresso Brasileiro de Energia Solar -Belém, 21 a 24 de setembro de 2010 photovoltaic devices is very dependent on the high quality waste from microelectronics industry of Si wafers, which are approximately 0.470mm in thick. With the shrinking of microelectronic devices such waste becomes proportionally scarce. Current efforts focus on preparation of alternative photovoltaic devices, based on the active light absorbing layer thickness reduction. These lower-cost cell substrates known as silicon thin films wafers equivalents. It is well known that, in these devices, lower values of grain size are limiting factors to increase the efficiency of solar cells produced with pc-Si. The aim of this work is to characterize optical and micro structural the pc-Si films prepared by gas chemical vapor deposition (thermal CVD). These films were prepared as an initial reference for low cost substrates production for solar cells based on the wafer equivalent concept. The characterizations were performed by Raman microscopy, optical microscopy and scanning electron microscopy with EBSD signals. The results were correlated with additional X-ray diffraction measurements. They demonstrated the deposition of multicrystalline Si (mc-Si) films with high crystalline quality. Also it showed mc-Si grain size considerably higher and deposition rates three times higher than recently values reported by other authors.