The influence of beam defocus on volume growth rates for electron beam induced platinum deposition

Plank, Harald; Dienstleder, Martina; Kothleitner, Gerald; Hofer, Ferdinand

doi:10.1007/978-3-540-85156-1_342

Cited by 12 publications

(30 citation statements)

References 4 publications

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“…The upper panel of Figure 4 acts as the control experiment and shows the structure diameter variation as a function of the blurred primary beam for 91 nm•s −1 , which reveals an almost linear behavior as expected. 28 The lower panel summarizes the implications of a defocused, blurred beam on the final segment angles for different PVs. Note, the highest acceptable blur before no 3D-segment can be fabricated is represented by the last data points in the graph for each PV.…”

Section: Resultsmentioning

confidence: 99%

High-Fidelity 3D-Nanoprinting via Focused Electron Beams: Growth Fundamentals

Winkler

Lewis

Fowlkes

et al. 2018

ACS Appl. Nano Mater.

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120

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While 3D-printing is currently experiencing significant growth and having a significant impact on science and technology, the expansion into the nanoworld is still a highly challenging task. Among the increasing number of approaches, focused electron-beam-induced deposition (FEBID) was recently demonstrated to be a viable candidate toward a generic direct-write fabrication technology with spatial nanometer accuracy for complex shaped 3D-nanoarchitectures. In this comprehensive study, we explore the parameter space for 3D-FEBID and investigate the implications of individual and interdependent parameters on freestanding nanosegments, which act as a fundamental building block for complex 3D-structures. In particular, the study provides new basic insights such as precursor transport limitations and angle dependent growth rates, both essential for high-fidelity fabrication. Complemented by practical aspects, we provide both basic insights in 3D-growth dynamics and technical guidance for specific process adaption to enable predictable and reliable direct-write synthesis of freestanding 3D-nanoarchitectures.

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Section: Resultsmentioning

confidence: 99%

High-Fidelity 3D-Nanoprinting via Focused Electron Beams: Growth Fundamentals

Winkler

Lewis

Fowlkes

et al. 2018

ACS Appl. Nano Mater.

Self Cite

120

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“…It should also be noted, that this BSE-Pt growth concept can also explain the typically observed dimensions of 1D nanopillars between 50 and 70 nm for MeCpPt(IV)Me 3 precursor on bulk substrates [1][2][3]7,8,38 which are in the same range as the BSE-Pt diameter in contrast to the electron beams which often are an order of magnitude smaller.…”

Section: ■ Discussionmentioning

confidence: 98%

Fundamental Resolution Limits during Electron-Induced Direct-Write Synthesis

Arnold

Timilsina

Fowlkes

et al. 2014

ACS Appl. Mater. Interfaces

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In this study, we focus on the resolution limits for quasi 2-D single lines synthesized via focused electron-beam-induced direct-write deposition at 5 and 30 keV in a scanning electron microscope. To understand the relevant proximal broadening effects, the substrates were thicker than the beam penetration depth and we used the MeCpPt(IV)Me3 precursor under standard gas injection system conditions. It is shown by experiment and simulation how backscatter electron yields increase during the initial growth stages which broaden the single lines consistent with the backscatter range of the deposited material. By this it is shown that the beam diameter together with the evolving backscatter radius of the deposit material determines the achievable line widths even for ultrathin deposit heights in the sub-5-nm regime.

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“…In both cases, this effectively leads to an electron beam defocus. As reported by Plank et al [28], the effect of defocusing the primary electron beam leads in FEBID to an increase of the nanowire's diameter. On the other hand, the high electric field will strongly modify the trajectory of the secondary electrons [27], which are also crucial for the FEBID growth, as discussed above.…”

Section: Resultsmentioning

confidence: 63%

“…Secondly, the growth of 3D FEBID structures with variable diameter is achieved by in-situ tuning of the beam focus. Although the dimension broadening effect of beam defocus was reported in FEBID [28], in-situ control of this parameter to obtain 3D structures with tailored varying diameters represents a new avenue in the use of FEBID for the growth of functional magnetic, superconducting or photonic materials.…”

Section: Introductionmentioning

confidence: 99%

Diameter modulation of 3D nanostructures in focused electron beam induced deposition using local electric fields and beam defocus

2019

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Focused Electron Beam Induced Deposition (FEBID) is a leading nanolithography technique in terms of resolution and the capability for three-dimensional (3D) growth of functional nanostructures. However, FEBID still presents some limitations with respect to the precise control of the dimensions of the grown nano-objects as well as its use on insulating substrates. In the present work, we overcome both limitations by employing electrically-biased metal structures patterned on the surface of insulating substrates. Such patterned metal structures serve for charge dissipation and also allow the application of spatially-dependent electric fields. We demonstrate that such electric fields can dramatically change the dimensions of the growing 3D nanostructures 2 by acting on the primary electron beam and the generated secondary electrons. In the performed experiments, the diameter of Pt-C and W-C vertical nanowires grown on quartz, MgO and amorphous SiO2 is tuned by application of moderate voltages (up to 200 V) on the patterned metal microstructures during growth, achieving diameters as small as 50 nm. We identify two competing effects arising from the generated electric fields: a slight change in the primary beam focus point and a strong action on the secondary electrons. Beam defocus is exploited to achieve the in-situ modulation of the diameter of 3D FEBID structures during growth.

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The influence of beam defocus on volume growth rates for electron beam induced platinum deposition

Cited by 12 publications

References 4 publications

High-Fidelity 3D-Nanoprinting via Focused Electron Beams: Growth Fundamentals

High-Fidelity 3D-Nanoprinting via Focused Electron Beams: Growth Fundamentals

Fundamental Resolution Limits during Electron-Induced Direct-Write Synthesis

Diameter modulation of 3D nanostructures in focused electron beam induced deposition using local electric fields and beam defocus

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