“…Additionally, there is a facility in the pulsed electrodeposition that applies different durations of off-time between pulses in order to limit the hydrogen and heat evolutions at the deposition interface so as to stabilize the process [23]. Using a pulsed ac electrodeposition also improves the pore-filling of PAO templates, uniformity and crystallinity of the arrays of Fe, Co and Ni NWs due to the improvement in the homogeneity of the electrodeposition [13,24,25]. However, one of the major challenges in the pulsed ac electrodeposition process is the task of maintaining the dielectric property of the barrier layer during the process.…”