2004
DOI: 10.1016/j.mseb.2004.08.004
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The influence of crystallization route on the properties of lanthanum-doped Bi4Ti3O12 thin films prepared from polymeric precursors

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Cited by 7 publications
(1 citation statement)
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“…5, the voltage changed from Ϫ30 to +30 V and the leakage current density were below 1.4 ϫ 10 −10 A / cm 2 for all three samples in which different Nd content doped. The insulating properties are better than that of Bi 3.15 Nd 0.85 Ti 3 O 12 thin film and other rare-earth elements doped BIT thin films, [29][30][31] which is possibly caused by the discontinuous nanotubes or the bad contact between nanotubes and electrodes. One can also see that the leakage current density has a little decrease with the increasing content of Nd in the compound.…”
Section: Resultsmentioning
confidence: 99%
“…5, the voltage changed from Ϫ30 to +30 V and the leakage current density were below 1.4 ϫ 10 −10 A / cm 2 for all three samples in which different Nd content doped. The insulating properties are better than that of Bi 3.15 Nd 0.85 Ti 3 O 12 thin film and other rare-earth elements doped BIT thin films, [29][30][31] which is possibly caused by the discontinuous nanotubes or the bad contact between nanotubes and electrodes. One can also see that the leakage current density has a little decrease with the increasing content of Nd in the compound.…”
Section: Resultsmentioning
confidence: 99%