2014
DOI: 10.1155/2014/126053
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The Influence of Electrophoretic Deposition for Fabricating Dye‐Sensitized Solar Cell

Abstract: Titanium dioxide (TiO2) film was deposited on fluorine-doped tin oxide (FTO) glass substrate by electrophoretic deposition method (EPD). TiO2films were prepared with different I2dosages, electric field intensities and deposition time (D.T.), electrophotic deposition times. By different I2dosages, electric field intensities, deposition time, electrophotic deposition times fabricated TiO2films and compared photoelectric characteristics of TiO2films to find optimal parameters which were the highest photovoltaic c… Show more

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Cited by 14 publications
(4 citation statements)
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“…3 g titanium dioxide (TiO 2 ) powder, 4 mL deionized water, 0.05 mL acetylacetone (AcAc), 0.15 mL Triton X-100, and 2 mL graphene oxide (GO) were placed into bottles and stirred for 12 h. TiO 2 colloid was deposited on the FTO glass via the spin coating method at 1000 rpm for 11.5 s followed by coating at 2500 rpm for 15 s and was sintered at 450 °C in an annealing furnace for 30 min. Afterwards, a TiO 2 mixture consisting of 0.25 g TiO 2 powder, 0.025 g iodine (I 2 ), and 25 mL AcAc was coated on the top of the TiO 2 /GO layer by electrophoretic deposition [ 34 ]. Finally, the double-layer TiO 2 photoelectrode was annealed at 450 °C for 30 min again.…”
Section: Methodsmentioning
confidence: 99%
“…3 g titanium dioxide (TiO 2 ) powder, 4 mL deionized water, 0.05 mL acetylacetone (AcAc), 0.15 mL Triton X-100, and 2 mL graphene oxide (GO) were placed into bottles and stirred for 12 h. TiO 2 colloid was deposited on the FTO glass via the spin coating method at 1000 rpm for 11.5 s followed by coating at 2500 rpm for 15 s and was sintered at 450 °C in an annealing furnace for 30 min. Afterwards, a TiO 2 mixture consisting of 0.25 g TiO 2 powder, 0.025 g iodine (I 2 ), and 25 mL AcAc was coated on the top of the TiO 2 /GO layer by electrophoretic deposition [ 34 ]. Finally, the double-layer TiO 2 photoelectrode was annealed at 450 °C for 30 min again.…”
Section: Methodsmentioning
confidence: 99%
“…Electrophoretic deposition meanwhile, deposits charged particles onto a substrate by applying direct current (DC) voltage after the movement of charged particles in a suspension medium is completed [50]. The deposition method possessed several advantages including simple equipment, low cost, high rate of deposition, no requirement of binder, ability to prepare any shape of conductive substrate desired and high reproducibility [50,51]. A summary of several fabrication techniques applied for low temperature DSSC can be seen in Table 2.…”
Section: Figure 4 Classification Of Several Fabrication Techniques Fo...mentioning
confidence: 99%
“…3). EPD was also the technique used to deposit TiO 2 nanoparticles for dye-sensitized solar cells (DSSC) [32] and Li-ion micro-batteries applications [33]. For DSSC, the thickness of the TiO 2 films was controlled by changing the deposition time and the I 2 dosage that electrically charge the nanoparticles, while for batteries, the EPD was performed with different TiO 2 structures and different 3D aluminum collectors configurations (Fig.…”
Section: Figurementioning
confidence: 99%