The influence of filament material on radical production in hot wire chemical vapor deposition of a-Si:H

Duan, Heying; Bent, Stacey F.

doi:10.1016/j.tsf.2005.03.038

Cited by 34 publications

(42 citation statements)

References 33 publications

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“…This idea is supported by the result that the [H]/[O] density ratio is around 2 at high catalyst temperatures. A similar complete decomposition mechanism has been proposed for SiH 4 when the W catalyst temperature is higher than 2000 K [23,24]. In this case, SiH 2 and SiH 3 densities decreased with the increase in the catalysis temperature [23].…”

Section: Discussionsupporting

confidence: 72%

Catalytic Decomposition of H2O(D2O) on a Heated Ir Filament to Produce O and OH(OD) Radicals

Umemoto¹,

Kusanagi²

2009

TOCPJ

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Production of O atoms, H(D) atoms, and OH(OD) radicals was confirmed in the catalytic decomposition of H 2 O(D 2 O) on a heated Ir filament by laser spectroscopic techniques, such as vacuum-ultraviolet laser-induced fluorescence. The highest steady-state OH density achieved was 2 10 11 cm -3 . The filament temperature dependences of the radical densities were not Arrhenius-type, in contrast to the results on the decomposition of H 2 and O 2 . Especially, OH(OD) density decreased with the increase in the filament temperature over 2100 K. The decomposition process changes from the production of H+OH(D+OD) to that of 2H+O(2D+O) with the increase in the catalysis temperature. This change in the exit channel could not be reproduced by model calculations using the CHEMKIN software package when Arrhenius-type temperature dependences were assumed for the elementary-step rate constants on surfaces. It is necessary to assume that the desorption energy of OH(OD) is surface coverage dependent.

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Section: Discussionsupporting

confidence: 72%

Catalytic Decomposition of H2O(D2O) on a Heated Ir Filament to Produce O and OH(OD) Radicals

Umemoto¹,

Kusanagi²

2009

TOCPJ

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“…For Cat-CVD of Si films, Ta catalyst has a relatively longer lifetime than W for the slower growth rate of tantalum silicide than tungsten silicide [10,27,28]. And TaC is more stable than Ta in terms of physical properties such as melting point and hardness, which is different from tungsten carbides (WC and W 2 C) with the lower melting points than W. Consequently, we were motivated to prepare Si films using the TaC coated Ta catalyst.…”

Section: Introductionmentioning

confidence: 99%

Carbonized tantalum catalysts for catalytic chemical vapor deposition of silicon films

et al. 2012

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“…However, by estimating the catalytic activity drop caused by the decrease in temperature from 1900 ºC to 1750 ºC, it is found a maximum reduction of only 20 %. This result was obtained using 60 kJ/moles for the activation energy of the silane decomposition [18]. This means that the chemical change from W to W 5 Si 3 is also relevant for understanding the observed drop of the catalytic activity.…”

Section: Resultsmentioning

confidence: 71%

Degradation of thin tungsten filaments at high temperature in HWCVD

2015

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The degradation of the filaments is usually studied by checking the silicidation or carbonization status of the refractory metal used as catalysts, and their effects on the structural stability of the filaments. In this paper, it will be shown that the catalytic stability of a filament heated at high temperature is much shorter than its structural lifetime. The electrical resistance of a thin tungsten filament and the deposition rate of the deposited thin film have been monitored during the filament aging. It has been found that the deposition rate drops drastically once the quantity of dissolved silicon in the tungsten reaches the solubility limit and the silicides start precipitating. This manuscript concludes that the catalytic stability is only guaranteed for a short time and that for sufficiently thick filaments it does not depend on the filament radius.

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The influence of filament material on radical production in hot wire chemical vapor deposition of a-Si:H

Cited by 34 publications

References 33 publications

Catalytic Decomposition of H2O(D2O) on a Heated Ir Filament to Produce O and OH(OD) Radicals

Catalytic Decomposition of H2O(D2O) on a Heated Ir Filament to Produce O and OH(OD) Radicals

Carbonized tantalum catalysts for catalytic chemical vapor deposition of silicon films

Degradation of thin tungsten filaments at high temperature in HWCVD

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