The influence of low concentration of 2-(5-methyl-2-nitro-1H-imidazol-1-yl)ethyl benzoate on corrosion brass in 0.5 M H2SO4 solution

Khrifou, R.; Touir, R.; Koulou, A.; Bakri, H. El; Rbaa, Mohamed; Touhami, M. Ebn; Zarrouk, A.; Benhiba, F.

doi:10.1016/j.surfin.2021.101088

Cited by 13 publications

(4 citation statements)

References 61 publications

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“…The neutralization of the negative charge of the SiO 2 particles reduces the electrostatic repulsive force between SiO 2 abrasives and the negatively charged Cu surface, thus strengthening the mechanical action, which is prone to causing surface scratches and other defects, leading to a decrease in surface quality. 53 The average particle size of the slurry when AMP is used as a pH regulator is 63.9 nm, close to 63.1 nm, and the average particle size is lower than that when KOH and DEA are used as pH regulators. It can be seen that AMP has the smallest impact on the average particle size of the slurry, while DEA has the greatest impact on the average particle size of the slurry.…”

Section: Resultsmentioning

confidence: 87%

Effect of Novel pH Regulators on Copper film Chemical Mechanical Polishing for Ruthenium-Based Copper Interconnect under Weak Alkalinity Conditions

Dong,

Niu,

Liu

et al. 2024

ECS J. Solid State Sci. Technol.

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For Ruthenium (Ru)-based copper (Cu) interconnects Cu film chemical mechanical polishing (CMP), it is crucial to select appropriate pH regulators in the slurry to ensure the chemical reactions and maintain the stability of the polishing chemical environment. In this study, the effects of inorganic pH regulator KOH, organic pH regulator diethanolamine (DEA), and 2-amino-2-methyl-1-propanol (AMP) on CMP and slurry properties of Cu film were compared. It was found when using AMP as a pH regulator, the Cu/Ru removal rate selectivity (RRS) can reach 598:1, the surface roughness of Cu film decreased to 0.76 nm, and the slurry can remain stable for at least 7 days. The performance order of the three pH regulators is AMP＞KOH＞DEA. Meanwhile, through experimental results and test analysis, it has been confirmed that AMP can also play a multifunctional role as a complexing agent, dispersant, and surfactant. Therefore, AMP can replace KOH as a new pH regulator in weak alkaline slurries. This result plays an important role in guiding the selection of organic pH regulators in the optimization of Cu film CMP slurry.

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Section: Resultsmentioning

confidence: 87%

Effect of Novel pH Regulators on Copper film Chemical Mechanical Polishing for Ruthenium-Based Copper Interconnect under Weak Alkalinity Conditions

Dong,

Niu,

Liu

et al. 2024

ECS J. Solid State Sci. Technol.

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“…The CPE impedance is calculated by eq : , Z CPE = false[ Q false( normalj ω false) n false] − 1 where ω is the angular frequency, j is the imaginary unit, and n is the parameter of deviation related to the phase deviation, which is one of the most important aspects of the CPE. When n = 0, the CPE is like a pure resistor; for n = 1, the CPE is a pure capacitor …”

Section: Discussion and The Results Of The Studymentioning

confidence: 99%

“…When n = 0, the CPE is like a pure resistor; for n = 1, the CPE is a pure capacitor. 34 Inhibitory efficacy (IE) was evaluated using eq 6: 35 = °× i k j j j j j j y…”

Section: Eis Measurements Figures 2a−c Andmentioning

confidence: 99%

Investigating the Inhibitory Properties of Cupressus sempervirens Extract against Copper Corrosion in 0.5 M H₂SO₄: Combining Quantum (Density Functional Theory Calculation–Monte Carlo Simulation) and Electrochemical-Surface Studies

et al. 2023

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The study investigates the potential of Cupressus sempervirens (EO) as a sustainable and eco-friendly inhibitor of copper corrosion in a 0.5 M sulfuric acid medium. The electrochemical impedance spectroscopy analysis shows that the effectiveness of corrosion inhibition rises with increasing inhibitor concentrations, reaching 94% with the application of 2 g/L of EO, and potentiodynamic polarization (PDP) studies reveal that EO functions as a mixed-type corrosion inhibitor. In addition, the Langmuir adsorption isotherm is an effective descriptor of its adsorption. Scanning electron microscopy/ energy-dispersive X-ray spectroscopy, atomic force microscopy surface examination, and contact angle measurement indicate that EO may form a barrier layer on the metal surface. Density functional theory calculations, Monte Carlo simulation models, and the radial distribution function were also used to provide a more detailed understanding of the corrosion protection mechanism. Overall, the findings suggest that Cupressus sempervirens (EO) has the potential to serve as an effective and sustainable corrosion inhibitor for copper in a sulfuric acid medium, contributing to the development of green corrosion inhibitors for environmentally friendly industrial processes.

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“…According to the reported references, 51 the (111) surface of copper was widely used as the simplified model for brass simulation. Similarly, a two-layered periodic brass model with 20 Å vacuum slab was constructed based on the Cu (111) surface.…”

Section: Methodsmentioning

confidence: 99%

Experimental and theoretical study of tetraphenylethylene-based dicationic compounds for corrosion inhibition of steel and brass in an acidic medium

Chen

et al. 2023

New J. Chem.

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The influence of low concentration of 2-(5-methyl-2-nitro-1H-imidazol-1-yl)ethyl benzoate on corrosion brass in 0.5 M H2SO4 solution

Cited by 13 publications

References 61 publications

Effect of Novel pH Regulators on Copper film Chemical Mechanical Polishing for Ruthenium-Based Copper Interconnect under Weak Alkalinity Conditions

Effect of Novel pH Regulators on Copper film Chemical Mechanical Polishing for Ruthenium-Based Copper Interconnect under Weak Alkalinity Conditions

Investigating the Inhibitory Properties of Cupressus sempervirens Extract against Copper Corrosion in 0.5 M H₂SO₄: Combining Quantum (Density Functional Theory Calculation–Monte Carlo Simulation) and Electrochemical-Surface Studies

Experimental and theoretical study of tetraphenylethylene-based dicationic compounds for corrosion inhibition of steel and brass in an acidic medium

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The influence of low concentration of 2-(5-methyl-2-nitro-1H-imidazol-1-yl)ethyl benzoate on corrosion brass in 0.5 M H2SO4 solution

Cited by 13 publications

References 61 publications

Effect of Novel pH Regulators on Copper film Chemical Mechanical Polishing for Ruthenium-Based Copper Interconnect under Weak Alkalinity Conditions

Effect of Novel pH Regulators on Copper film Chemical Mechanical Polishing for Ruthenium-Based Copper Interconnect under Weak Alkalinity Conditions

Investigating the Inhibitory Properties of Cupressus sempervirens Extract against Copper Corrosion in 0.5 M H2SO4: Combining Quantum (Density Functional Theory Calculation–Monte Carlo Simulation) and Electrochemical-Surface Studies

Experimental and theoretical study of tetraphenylethylene-based dicationic compounds for corrosion inhibition of steel and brass in an acidic medium

Contact Info

Product

Resources

About

Investigating the Inhibitory Properties of Cupressus sempervirens Extract against Copper Corrosion in 0.5 M H₂SO₄: Combining Quantum (Density Functional Theory Calculation–Monte Carlo Simulation) and Electrochemical-Surface Studies