2021
DOI: 10.3390/coatings11121507
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The Influence of Magnetron Sputtering Process Temperature on ZnO Thin-Film Properties

Abstract: The important research direction in surface engineering and photovoltaics is the development of new materials that can replace the previously used expensive films. A prospective compound is zinc oxide (ZnO), characterized by optical and electrical properties similar to ITO and a lower production cost. One of the key factors influencing the properties of the ZnO thin films is the technique and parameters of their production. The comprehensive investigation results of the influence of ZnO thin-films deposition p… Show more

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Cited by 12 publications
(3 citation statements)
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“…This issue could be resolved by further optimizing the deposition conditions (if required). [ 26 , 27 ] Additionally, the EDX mapping images of the Ti, C, Ag, and Zn suggested that Zn was uniformly doped throughout the top Zn@Ti 3 C 2 T x MXene layer of the FTCE.…”
Section: Resultsmentioning
confidence: 99%
“…This issue could be resolved by further optimizing the deposition conditions (if required). [ 26 , 27 ] Additionally, the EDX mapping images of the Ti, C, Ag, and Zn suggested that Zn was uniformly doped throughout the top Zn@Ti 3 C 2 T x MXene layer of the FTCE.…”
Section: Resultsmentioning
confidence: 99%
“…Many methods are used to produce ZnO thin layers, including atomic layer deposition (ALD) [13], sputtering [14], spray pyrolysis [8], electrodeposition [15], microwave assisted synthesis [16], and sol-gel [17]. Innovative methods are also used, e.g., simultaneous etching and Al doping of H 2 O-oxidized ZnO nanorods to generate Al-doped ZnO nanotubes [18].…”
Section: Introductionmentioning
confidence: 99%
“…Sputtering parameters like annealing temperature, working pressure, RF power, gas flow rate, and type of substrate plays vital role in the growth of ZnO thin films [12,13]. Zeng et al reported that substrate temperature can change crystal quality and thereby optical properties [14].…”
Section: Introductionmentioning
confidence: 99%