An electron beam plasma source operated at atmospheric gases with beam energy lower than 25 keV is very challenging because the electron transmission window (ETW) is hard to balance between thermal–mechanical robustness and collisional energy loss control. In this article, based on the mechanism of secondary field emission processes, an ETW within a micro/nano-structure is prepared by microfabrication and metal-assisted chemical etching, which can endure 0.21 MPa differential pressure, and shows transmission efficiencies with 17.14%, 25.38%, and 31.97% at −6, −7, and −8 kV pulsed voltages. A novel minimized pulsed plasma source (PPS) is packaged by using this kind of ETW, which can extract low-energy electrons from 10−4 Pa vacuum into the environment of 105 Pa to produce pulsed plasma. The spatial distribution of the resulting plasma could be controlled, which shows the axial and radial spatial distributions range from 3 to 15 mm and 4 to 8 mm, respectively. The plasma has pulsed characteristics, and it is generated around 20 μs and disappears in about 200 μs. The maximum electron density of pulsed argon plasma is 8.64×1014 cm−3 at −8 kV pulsed voltage, which is in accordance with the simulation based on the diffusion-drift model of electron beam plasma. To explore the interference effect when PPS units are operated in an array model, numerical simulations of the transmission probability are compared for different cases of plasma density, and a feasible arrangement strategy is suggested.