2016
DOI: 10.1063/1.4972833
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The influence of non-stoichiometry on the switching kinetics of strontium-titanate ReRAM devices

Abstract: Vertical power MOS transistor as a thermoelectric quasi-nanowire device J. Appl. Phys. 120, 244903244903 (2016) . The STO films, deposited by atomic layer deposition, were integrated in Pt/STO/TiN nanocrossbars with a feature size of 100 nm. By analysis of the transient currents, the switching kinetics are investigated between 10 ns and 10 4 s for the SET and 10 ns and 100 s for the RESET. A clear influence of the composition on the degree of nonlinearity of the switching kinetics was observed. Applying an ana… Show more

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Cited by 10 publications
(7 citation statements)
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“…In this study, we propose a different failure mechanism limiting the RESET kinetics in the subnanosecond regime: For this purpose, we focus on the RESET kinetics in the regime from 50 ns to 50 ps and show that they are intrinsically limited by the presence of a unipolar switching mode. , Unlike previous studies, we also acquired a much larger data set to demonstrate the reproducibility of successful RESET operations. At slower time scales (above 700 ps) the RESET kinetics depend exponentially on the applied voltage, which was already demonstrated in other studies. , By increasing the applied voltage we could successfully reset the TaO x -based device within 670 ps at a voltage of 1.6 V and the ZrO x -based device within 480 ps at a voltage of 1.8 V. At higher voltages, the devices could not be driven to the HRS. Instead of an increase in resistance, a unipolar SET could be observed, decreasing the device’s resistance and, thereby, preventing faster RESET times.…”
Section: Introductionsupporting
confidence: 75%
See 1 more Smart Citation
“…In this study, we propose a different failure mechanism limiting the RESET kinetics in the subnanosecond regime: For this purpose, we focus on the RESET kinetics in the regime from 50 ns to 50 ps and show that they are intrinsically limited by the presence of a unipolar switching mode. , Unlike previous studies, we also acquired a much larger data set to demonstrate the reproducibility of successful RESET operations. At slower time scales (above 700 ps) the RESET kinetics depend exponentially on the applied voltage, which was already demonstrated in other studies. , By increasing the applied voltage we could successfully reset the TaO x -based device within 670 ps at a voltage of 1.6 V and the ZrO x -based device within 480 ps at a voltage of 1.8 V. At higher voltages, the devices could not be driven to the HRS. Instead of an increase in resistance, a unipolar SET could be observed, decreasing the device’s resistance and, thereby, preventing faster RESET times.…”
Section: Introductionsupporting
confidence: 75%
“…To determine the RESET time from this current response, the beginning of the pulse and the RESET event need to be determined. In studies on slower time scales, the time at the end of the voltage pulse’s rising edge is often taken as the pulse’s beginning, , which is valid as long as the rise time is neglectable compared to the determined switching time. As this study investigates the RESET kinetics on a subnanosecond time scale, the RESET time is on a similar time scale than the pulse generator’s rise time (approximately 360 ps).…”
Section: Resultsmentioning
confidence: 99%
“…Different to previous studies, we also acquired a much larger dataset to demonstrate the reproducibility of successful RESET operations. At slower timescales (above 700 ps) the RESET kinetics depend exponentially on the applied voltage, which was already demonstrated in other studies [28,[44][45][46][47]. By increasing the applied voltage we could successfully reset the TaO x -based device within 670 ps at a voltage of 1.6 V and the ZrO x -based device within 480 ps at an voltage of 1.8 V. At higher voltages, the devices could not be driven to the HRS.…”
Section: Introductionsupporting
confidence: 75%
“…It is similar to the one used in refs. . The switching kinetics are assumed to be limited by the migration of doubly charged oxygen vacancies only, as this process is strongly temperature dependent.…”
Section: Discussionmentioning
confidence: 99%