2009
DOI: 10.1016/j.optlaseng.2009.02.001
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The influence of substrate temperature on femtosecond laser micro-processing of silicon, stainless steel and glass

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Cited by 31 publications
(27 citation statements)
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“…The effect of substrate temperature on ultrafast laser ablation of silicon (thickness 650 mm), stainless steel (thickness 100 mm) and glass (thickness 1 mm) was reported by Yahng et al [107]. It was observed that the increase of surface temperature decreases the surface roughness for all three samples.…”
Section: Metalsmentioning
confidence: 60%
“…The effect of substrate temperature on ultrafast laser ablation of silicon (thickness 650 mm), stainless steel (thickness 100 mm) and glass (thickness 1 mm) was reported by Yahng et al [107]. It was observed that the increase of surface temperature decreases the surface roughness for all three samples.…”
Section: Metalsmentioning
confidence: 60%
“…Thus, for Au the threshold fluence does not change if the sample is thicker than 800 nm, and for Ni saturation is reached at 50 nm [64]. Yahng et al (2009) studied the effect of the sample temperature on threshold fluence and found that for Si the threshold fluence decreases with increasing temperature from 300 to 900 K, whereas for SS304 no change in ablation threshold was found, but the ablation efficiency increased by 20% [67]. This behaviour can be attributed to the increase in the absorption coefficient at high temperature.…”
Section: Ablation Thresholdmentioning
confidence: 98%
“…Recently, we have reported preliminary result for the influence of substrate temperature at 900 K on femtosecond laser ablation of silicon, stainless steel, and glass. We found that the ablation efficiency as well as the surface roughness at high substrate temperature is strongly dependent on the material properties such as optical band gap and thermal conductivity [14].…”
Section: Introductionmentioning
confidence: 90%