The influence of target erosion grade in the optoelectronic properties of AZO coatings growth by magnetron sputtering

Facile Synthesis of Self-Assembled NiFe Layered Double Hydroxide-Based Azobenzene Composite Films with Photoisomerization and Chemical Gas Sensor Performances

“…It has been mentioned in existing articles that this photoisomerization of Azo and its derivatives, as well as many other physical and chemical properties, originates from the nonlocality of π electrons. The trans–cis isomerization process for can be completed by either the π–π* energy level or the n−π* energy level . In addition, there is a statement that azobenzene dyes form modified materials with polymers through doping or cross-linking.…”

Spatially Resolved Optoelectronic Properties of Al-Doped Zinc Oxide Thin Films Deposited by Radio-Frequency Magnetron Plasma Sputtering Without Substrate Heating

“…For example, cost effective solar cells based on Cu (In,Ga)Se 2 (CIGS) and Cu 2 ZnSnS 4 (CZTS) absorbers have been fabricated with a TCO based on AZO [6,7]. There are several methods used to deposit AZO, including physical vapor deposition (under various operation conditions for magnetron sputtering, such as radio-frequency [8][9][10][11][12][13][14][15][16][17][18][19][20], medium-frequency [8,[21][22][23][24][25][26], DC [8,16,22,[26][27][28][29][30][31][32][33][34][35][36][37], pulsed DC [38], high power impulse [39,40], ion beam assisted [41], chemical vapor deposition [1,5] and other chemical methods such as spin coating and sol gel [2,4]. Among them, magnetron plasma sputtering has been successfully used to deposit ITO on large area substrates (up to 15 m 2 ) and is also regarded as a viable and cost effective solution for AZO …”

Structural and Optical Properties of ZnO:Al Thin Films Produced by Magnetron Sputtering with Different Oxygen Flow: An Experimental and Ab Initio Study

“…Thus, as suggested by the results presented in Figure 1, with the increase of O 2 in the deposition atmosphere, there is the formation of ZnO phases; that is, a reduction in the doping of ZnO:Al films; however, it is noted that for the atmosphere with 25% O 2 , there is the doping of ZnO with 2% Al, reported by several authors as ideal concentration. [ 3–5,9,25,42 ]…”

“…Transparent conductive oxide (TCO) films stand out for their application in the industries of electronics, solar cells, electrochromic panels, light‐emitting diode/active‐matrix organic light‐emitting diode screens, among others. [ 1–4 ] In the last decade, researchers have sought to optimize the deposition processes of thin films for application as TCO, [ 5–7 ] films such as a fluorine‐doped tin oxide (FTO), tin‐doped indium oxide (ITO), oxide of zinc doped with aluminum (AZO), and variations of these with different codopants. [ 2–4,6–8 ] For application as TCO, the film must have, mainly, a transmittance of ≈80%, low bandgap (≈3 eV), and low resistivity.…”

“…[ 1–4 ] In the last decade, researchers have sought to optimize the deposition processes of thin films for application as TCO, [ 5–7 ] films such as a fluorine‐doped tin oxide (FTO), tin‐doped indium oxide (ITO), oxide of zinc doped with aluminum (AZO), and variations of these with different codopants. [ 2–4,6–8 ] For application as TCO, the film must have, mainly, a transmittance of ≈80%, low bandgap (≈3 eV), and low resistivity. [ 7 ] Among the thin‐film deposition techniques, the plasma‐assisted chemical vapor deposition (PACVD) stands out for being an easy control technique, environmentally correct, with the possibility of expanding its application and high reproducibility.…”