The influence of the composition and coating parameters of PVD Ti-Al-V(C.N) films on abrasive and adhesive wear of coated cemented carbides

Knotek, O.; Elsing, R.; Atzor, M.; Prengel, H.-G.

doi:10.1016/0043-1648(89)90123-3

Cited by 14 publications

(3 citation statements)

References 7 publications

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“…Reactive magnetron sputter deposition of complex Ti-AI-V(C/N) films is representative of the influences of processing parameters on the performance of hard coatings [31]. In this study it was shown that the addition of vanadium and aluminum to the composition of the film increased wear resistance but the V films were found to be brittle while the AI containing films were ductile.…”

Section: Hard Coatingsmentioning

confidence: 97%

The Science, Technology and Materials Applications of Physical Vapor Deposition Processes

O’Keefe¹,

Rigsbee

1995

Materials and Processes for Surface and Interface Engineering

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Section: Hard Coatingsmentioning

confidence: 97%

The Science, Technology and Materials Applications of Physical Vapor Deposition Processes

O’Keefe¹,

Rigsbee

1995

Materials and Processes for Surface and Interface Engineering

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“…Owing to the low process temperatures and the low resulting mobility of the atoms adsorbed at the substrate, P V D processes generally deposit stable and metastable coatings with extremely fine-grained microstructures, positively affecting strength and ductility [14]. Owing to the low process temperatures and the low resulting mobility of the atoms adsorbed at the substrate, P V D processes generally deposit stable and metastable coatings with extremely fine-grained microstructures, positively affecting strength and ductility [14].…”

Section: Beneficial Bonding and Grain Structurementioning

confidence: 99%

Multicomponent and multilayer physically vapour deposited coatings for cutting tools

Knotek¹,

Löffler²,

Krämer³

1992

Metallurgical Coatings and Thin Films 1992

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The physical vapour deposition (PVD) processes are characterized by high flexibility in terms of the film systems which can be deposited. The hard phases of the multicomponent and multilayer films can be formed from any desired metal and metalloid components. PVD films can also be deposited onto virtually any substrate material or workpiece geometry.The paper reviews PVD processes suitable for tool coating applications. It then characterizes advantages of multicomponent and multilayer coatings and describes the coating-tool combinations which are most widely used in industry and for which research results indicate the greatest future application potential. Particularly promising in this respect are PVD coatings which achieve significantly prolonged tool lives in interrupted cut machining, such as Ti-Zr-N, Ti-C-N and TiN/Ti-C-N multilayer coatings. 0257-8972/92/S5.00

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“…4 TiAlN coatings have usually been prepared by various physical vapor deposition processes, such as reactive sputtering, ion plating, and arc processes. 8,9 Layer deposition by reactive sputtering with two cathode targets ͑Ti and Al͒ assisted by electron cyclotron resonance ͑ECR͒ brings additional freedom to tailor film properties. 8,9 Layer deposition by reactive sputtering with two cathode targets ͑Ti and Al͒ assisted by electron cyclotron resonance ͑ECR͒ brings additional freedom to tailor film properties.…”

Section: Introductionmentioning

confidence: 99%

Graded TiAlN layers deposited by electron cyclotron resonance-assisted reactive sputtering

Raveh¹,

Rosén²,

Shneck³

et al. 1999

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Graded TiAlN layers were deposited by plasma reactive sputtering assisted by electron cyclotron resonance ͑ECR͒. For reactive sputtering, dual cathode radio-frequency magnetron targets, Ti and Al, were used. The layers were deposited using various combinations of variables such as power input, bias substrate voltage, and gas feed composition. The deposition process was monitored by optical emission spectroscopy ͑OES͒. The OES results indicate that microwave excitation added to radio-frequency plasma has contrasting effects on the Ti and Al concentration in the gas phase, enhancing titanium and quenching aluminum species reaching the deposited substrate. Thus, by the regulation of the ECR power and the ratio of nitrogen to argon flow, formation of graded layers is possible. The layers formed in this way were characterized with regard to structure, composition, and mechanical properties using an x-ray diffractometer, an Auger electron spectroscopy microscope, and a Vickers microhardness and scratch tester ͑for adhesion͒. It was observed that layers deposited at a low ECR power ͑р100 W͒ yielded an oriented ͑111͒ crystalline structure with good adhesion ͑failure load Ͼ70 N͒. These layers displayed a higher microhardness ͑ϳ25 GPa͒ at substrate bias voltage ͑ϳ50 VDC͒ than that of a grounded substrate ͑10-15 GPa͒. However, layers deposited at an ECR power higher than 100 W showed a random or amorphous structure with an intermediate adhesion range ͑failure load of 30-50 N͒. The relationship between the processing parameters, the structure, and the properties of the layers formed are presented and discussed.

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The influence of the composition and coating parameters of PVD Ti-Al-V(C.N) films on abrasive and adhesive wear of coated cemented carbides

Cited by 14 publications

References 7 publications

The Science, Technology and Materials Applications of Physical Vapor Deposition Processes

The Science, Technology and Materials Applications of Physical Vapor Deposition Processes

Multicomponent and multilayer physically vapour deposited coatings for cutting tools

Graded TiAlN layers deposited by electron cyclotron resonance-assisted reactive sputtering

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