“…Through a sequence of procedures including sealing, heating, cooling, and washing, the MOF film with tuned thickness, low roughness, and homogeneous distribution can be synthesized on various substrates, such as gold, silicon, indium tin oxide (ITO), and quartz. 117–121 Many factors, such as precursor volume, modulator and building block concentrations, reaction temperature/time, and water content can affect the film growth. 117,118,121 The use of a large precursor volume can result in the formation of thick MOF films.…”