2023
DOI: 10.1016/j.jfma.2022.10.011
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The influence on surface characteristic and biocompatibility of nano-SnO2-modified titanium implant material using atomic layer deposition technique

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Cited by 7 publications
(6 citation statements)
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“…MAO technology is a straightforward electrochemical surface modification technique that sparks a metal in an electrolyte at high potential and forms an oxide layer containing numerous microporous structures on the surface. Previous studies have confirmed that the hydrophilicity, cell proliferation, and in vitro osteogenic ability of solid-structured Ti2448 are improved after MAO treatment. , Moreover, when oxidized, Ti2448 alloy generates Nb 2 O 5 and SnO 2 , which are conducive to osteogenesis. Therefore, MAO technology holds significant promise for enhancing the surface activity of 3D-printed Ti2448 scaffolds with a low elastic modulus.…”
Section: Introductionmentioning
confidence: 83%
“…MAO technology is a straightforward electrochemical surface modification technique that sparks a metal in an electrolyte at high potential and forms an oxide layer containing numerous microporous structures on the surface. Previous studies have confirmed that the hydrophilicity, cell proliferation, and in vitro osteogenic ability of solid-structured Ti2448 are improved after MAO treatment. , Moreover, when oxidized, Ti2448 alloy generates Nb 2 O 5 and SnO 2 , which are conducive to osteogenesis. Therefore, MAO technology holds significant promise for enhancing the surface activity of 3D-printed Ti2448 scaffolds with a low elastic modulus.…”
Section: Introductionmentioning
confidence: 83%
“…It is also clear that the film is uniform, with no cracks or pores, Figure 3. This morphology generally enhances osseointegration [25][26][27].…”
Section: Structural and Morphological Characteristicsmentioning
confidence: 96%
“…These substrates exhibit different mechanical, optical, electrical, catalytic, and magnetic properties depending on the type of nanoparticle used for functionalization. As a result, new nanoparticle deposition techniques have been developed for this type of substrate [ 10 , 26 , 27 , 28 , 29 , 30 , 31 , 32 , 33 , 34 , 35 , 36 , 37 , 38 , 39 , 40 , 41 , 42 , 43 , 44 , 45 , 46 , 47 , 48 , 49 , 50 , 51 , 52 , 53 , 54 , 55 , 56 , 57 , 58 , 59 , 60 , 61 , 62 , 63 , 64 , 65 , 66 , 67 , 68 , 69 ]. The most prominent ones are presented below.…”
Section: Deposition Of Nanomaterials On Metallic Substratesmentioning
confidence: 99%
“…In the study by Sheng-Hao et al [53], the substrate was deposited in a commercial ALD system with the precursor and H 2 O at a chamber temperature of 200 • C. The precursor container was heated to 70 • C, and the H 2 O container was kept at room temperature during the ALD processing. A cycle consisted of six steps: precursor 1/dosing time, soak time, evacuation time; precursor 2/dosing time, soak time.…”
Section: Atomic Layer Deposition (Ald)mentioning
confidence: 99%