A key phenomenon in the interaction of MeV ions and solids is that the energy transferred from the primary ions to the target electrons is high compared with atomic and molecular binding energies, but low compared with the ion energy. This means that there is a high probability of modifying the chemical properties of the material (for patterning) or of inducing the emission of electromagnetic radiation (for analysis), yet the path of particle is changed by a negligible amount, which means that focused beams remain sharp even after penetrating long depths into the material. Developments in focusing MeV ions in recent years have pushed the useable beam diameters into the sub-micrometre region, which means that nuclear microbeams are poised to make an impact in both direct write fabrication and micro-analysis at length scales of interest in nanotechnology or microbiology. This paper reviews the science and technology underlying the use of nuclear microbeams (ion solid interactions, focusing systems) and reports on the present status and trends of applications in sub-micron scale applications.
Interactions between MeV ions and atoms: the key advantage of MeV ions in nanoscale applicationsMeV ions interact with the atoms of target materials through electrostatic forces between the charged electrons and nuclei of the atoms. Apart from a small fraction of ions which undergo large angle scattering resulting from a close approach to the nucleus (the Rutherford scattering), the primary effect of the interaction is to create a transient electric dipole excitation of the electron structure of the atom. Kinetic energy is absorbed from the ion and may result in ionisation or promoting one or more of the atomic electrons into excited states.The energy transferred from the ion to the atom depends on many factors, but can range from zero to a few tens of keV. This is large compared with electronic binding energies (especially those of valence electrons), giving a high probability of locally modifying the chemistry of the sample, but small compared with the primary ion energy, so that the ion is not strongly deflected or decelerated, and can undergo many thousands of atomic collisions while following an essentially straight path for a large part of its range. This is the unique advantage of MeV ions for high spatial resolution applications: there is a high probability of creating useful effects in the material, yet the primary ion has a long range and a straight path with low lateral scattering. This is demonstrated in Fig.