2012
DOI: 10.1155/2012/272387
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The Low‐Temperature Crystallization and Interface Characteristics of ZnInSnO/In Films Using a Bias‐Crystallization Mechanism

Abstract: This study presents a successful bias crystallization mechanism (BCM) based on an indium/glass substrate and applies it to fabrication of ZnInSnO (ZITO) transparent conductive oxide (TCO) films. The effects of bias-crystallization on electrical and structural properties of ZITO/In structure indicate that the current-induced Joule heating and interface diffusion were critical factors for low-temperature crystallization. With biases of 4 V and 0.1 A, the resistivity of the ZITO film was reduced from3.08×10−4 Ω∗c… Show more

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Cited by 2 publications
(2 citation statements)
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“…The pull test of the first bond was performed with a test length of 50 mm, yielding a strain rate of 5 × 10 −3 s −1 . Moreover, to better understand the differences between the Al-0.5Si and ZAS wires, current tests of the first bond (FAB) were compared [12][13][14][15][16], and a bias tensile test of the wires with different currents was performed. The schematic diagram in Figure 2 shows that, for the current test, the effective wire length was 30 mm, and the applied DC voltage increased at 0.05 V/sec from 0 V until the wire fused.…”
Section: Methodsmentioning
confidence: 99%
“…The pull test of the first bond was performed with a test length of 50 mm, yielding a strain rate of 5 × 10 −3 s −1 . Moreover, to better understand the differences between the Al-0.5Si and ZAS wires, current tests of the first bond (FAB) were compared [12][13][14][15][16], and a bias tensile test of the wires with different currents was performed. The schematic diagram in Figure 2 shows that, for the current test, the effective wire length was 30 mm, and the applied DC voltage increased at 0.05 V/sec from 0 V until the wire fused.…”
Section: Methodsmentioning
confidence: 99%
“…In addition, because the thickness of the TEM specimen was thin for the transmission of electrons, we conducted experiments on the crystallization in a bulk state to examine the effects of size differences. A probe station (MSTECH, MST 4000A) was used to apply a voltage to the top Ru electrode in the form of a rounded shape via a mask pattern [23]. Then, XRD (Bruker, D8 Advance) was used to confirm the crystallization before and after the voltage application in the bulk state and compare it to the in situ TEM results.…”
Section: Tem and Xrd Analysesmentioning
confidence: 99%