The mass spectrum, proton affinity and ion-molecule reactions of SO3

Munson, Burnaby; Smith, Danny E.; Polley, Charles W.

doi:10.1016/0020-7381(77)80058-2

Cited by 9 publications

(4 citation statements)

References 4 publications

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“…The presence of the less dominant SO peak in Fig. 3B (making the ratio close to 0.5 for SO:SO2) is an indication for the decomposition of oxidative sulfur species [37]. Sulfur dioxide was further released from the residual structure, resulting in the mass loss up to 3.5 % at 1200 °C.…”

Section: P R E P R I N Tmentioning

confidence: 91%

Conventional versus microwave-assisted roasting of sulfidic tailings: Mineralogical transformation and metal leaching behavior

Kamariah

Kalebić

Xanthopoulos

et al. 2022

Minerals Engineering

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Section: P R E P R I N Tmentioning

confidence: 91%

Conventional versus microwave-assisted roasting of sulfidic tailings: Mineralogical transformation and metal leaching behavior

Kamariah

Kalebić

Xanthopoulos

et al. 2022

Minerals Engineering

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“…However, earlier reports indicate that SO 3 + is difficult to observe under vacuum conditions. 40 In contrast, the SO 2 + ion signal may be produced from the electron impact ionization of SO 2 , SO 3 , or the parent SO 2 Cl 2 reactant gas.…”

Section: Resultsmentioning

confidence: 99%

Thermal Atomic Layer Etching of CoO, ZnO, Fe₂O₃, and NiO by Chlorination and Ligand Addition Using SO₂Cl₂ and Tetramethylethylenediamine

et al. 2023

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Thermal atomic layer etching (ALE) of CoO, ZnO, Fe2O3, and NiO was achieved using chlorination and ligand-addition reactions at 250 °C. This two-step process was accomplished by first chlorinating the metal oxide with SO2Cl2. Subsequently, ligand addition to the metal chloride was performed using tetramethylethylenediamine (TMEDA). In situ quadrupole mass spectrometry (QMS) studies on metal oxide powders revealed that CoO, ZnO, Fe2O3, and NiO all formed stable and volatile MCl2(TMEDA) compounds (M = Co, Zn, Fe, Ni) as etch products at 250 °C. These QMS studies of the sequential SO2Cl2 and TMEDA exposures were facilitated by a new reactor design with two nested inlet lines that transport the reactants separately to the powder substrate. The time-dependence of the reactants and products could also be monitored by the QMS investigations. The large SO2 + ion intensity observed at the beginning of the SO2Cl2 exposure was consistent with the chlorination reaction MO + SO2Cl2 → MCl2 + SO2 + (1/2)O2. The time-dependent QMS studies also observed the MCl x (TMEDA)+ ion intensity peaking at the beginning of the TMEDA exposures. The subsequent decay of the MCl x (TMEDA)+ ion intensity, while the (TMEDA)+ ion intensity remained constant, was evidence for a self-limiting ligand-addition reaction. The mass loss of the metal oxide powders was confirmed after sequential SO2Cl2 and TMEDA exposures. The etching of two of these metal oxides was also verified using separate experiments on flat substrates using SO2Cl2 and TMEDA exposures at 250 °C. For CoO thermal ALE, an etch rate of 4.1 Å/cycle at 250 °C was measured using X-ray reflectivity (XRR) studies. For ZnO thermal ALE, an etch rate of 0.12 Å/cycle at 250 °C was measured using quartz crystal microbalance (QCM) investigations. Other first row transition metal oxides were surveyed in addition to CoO, ZnO, Fe2O3, and NiO. QMS studies of TiO2, Cr2O3, and MnO2 showed no volatile species formation during sequential SO2Cl2 and TMEDA exposures at 250 °C. In contrast, V2O5 and CuO were spontaneously etched using SO2Cl2 at 250 °C, as determined by the observation of volatile VOCl3 and CuCl3 etch products, respectively. Calculated Gibbs free energy changes for the various etching reactions also supported the experimental observations for the first row transition metal oxides. These studies illustrate that the chlorination and ligand-addition reaction mechanism can provide a new avenue for the thermal ALE of a variety of transition metal oxides that have nonvolatile metal chlorides.

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“…(b) For SO 3(g) , these include the following: IR absorption (bands at 527 and 1391 cm -1 ); UV absorption; ,, mass spectrometry; ,, Raman spectrometry (band at 1067 cm -1 ); gas chromatography; , and solid-state potentiometric detection. , …”

Section: Introductionmentioning

confidence: 99%

“…(a) For SO 2(g) , these include the following: fluorescence (emission between 2400 and 4200 A°); [39][40][41] UV absorption (normally between 3200 and 1800 A°); 8,[42][43][44] IR absorption (bands at 518, 1151, and 1361 cm -1 ), 45,46 or with a quantum cascade laser, 47 or with superimposed polarized IR light; 48 mass spectrometry; [49][50][51] Raman spectrometry (band at 1151 cm -1 ); 52 gas chromatography 32,[53][54][55][56] or ion-exchange chromatography; 1,57 solid-state potentiometric detection; [58][59][60][61][62][63][64][65] changes in the resistance of metal oxide surfaces; [66][67][68] changes in the capacitance of SO 2 -sensitive films; 69,70 and coulometry. 71 (b) For SO 3(g) , these include the following: IR absorption (bands at 527 and 1391 cm -1 ); 72 UV absorption; 8,73,74 mass spectrometry; 50,51,75 Raman spectrometry (band at 1067 cm -1 ); 52 gas chromatography; 32,54 and solid-state potentiometric detection. 58,65…”

Section: Introductionmentioning

confidence: 99%

Simultaneous Determination of SO_3(g) and SO_2(g) in a Flowing Gas

Ibáñez

Batten

Wentworth

2008

Ind. Eng. Chem. Res.

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A method for assaying a flowing gas mixture for SO 2(g) and SO 3(g) is described. The proof-of-concept for this method presented here uses the quantitative reaction of SO 3(g) with CaC 2 O 4(s) at 325 °C to produce CO 2(g) . The gas mixture is passed first through a plug of CaC 2 O 4 and then through a series of two optical cells. SO 2(g) is measured directly at one cell by UV spectrometry, and SO 3(g) is measured indirectly as CO 2(g) at the second cell by IR spectrometry. Good correlation coefficients were found for both analytes. Potential interference by SO 2 on the IR response of CO 2 can be neglected within a 1% error marginsexcept when the ratio CO 2 /SO 2 is very small. A summary of key analytical methods for the analysis of sulfur oxides is given.

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The mass spectrum, proton affinity and ion-molecule reactions of SO3

Cited by 9 publications

References 4 publications

Conventional versus microwave-assisted roasting of sulfidic tailings: Mineralogical transformation and metal leaching behavior

Conventional versus microwave-assisted roasting of sulfidic tailings: Mineralogical transformation and metal leaching behavior

Thermal Atomic Layer Etching of CoO, ZnO, Fe₂O₃, and NiO by Chlorination and Ligand Addition Using SO₂Cl₂ and Tetramethylethylenediamine

Simultaneous Determination of SO_3(g) and SO_2(g) in a Flowing Gas

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The mass spectrum, proton affinity and ion-molecule reactions of SO3

Cited by 9 publications

References 4 publications

Conventional versus microwave-assisted roasting of sulfidic tailings: Mineralogical transformation and metal leaching behavior

Conventional versus microwave-assisted roasting of sulfidic tailings: Mineralogical transformation and metal leaching behavior

Thermal Atomic Layer Etching of CoO, ZnO, Fe2O3, and NiO by Chlorination and Ligand Addition Using SO2Cl2 and Tetramethylethylenediamine

Simultaneous Determination of SO3(g) and SO2(g) in a Flowing Gas

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Thermal Atomic Layer Etching of CoO, ZnO, Fe₂O₃, and NiO by Chlorination and Ligand Addition Using SO₂Cl₂ and Tetramethylethylenediamine

Simultaneous Determination of SO_3(g) and SO_2(g) in a Flowing Gas