Formation of an efficient thermal path is very important for thermal management. Besides high thermal conductivity, several other properties are also important, for example: Current technology applies pre-formed sections of indium [4,5], but production issues arise from the required inspection, handling, and fluxing steps. Yield and performance suffer from interfacial shortcomings of a foil-based technology [6]. On the other hand, electrolytic deposition may produce high purity indium deposits with good interfacial characteristics suitable for use in TIM applications. Thick, uniform, pure indium layers are required which satisfy the above mentioned criteria. Several trials were conducted to plate pure indium from alkaline and acidic media [7,8,9,10], but very few electroplating baths are commercially available, and those have a high metal content and low plating rate. Our new plating technology overcomes these disadvantages; higher speed, better throwing powers as well as reliable plated finishes are obtained.
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Copper PCB PadCopper Pillar Bump ability to relax thermal expansion stresses when joining two materials ability to form a void-free, micro-crack-free joint that is stable during thermal cycling lack of sensitivity to moisture and temperature changes manufacturing feasibility cost.•A new indium electroplating process was developed which provides pure indium deposits suitable as thermal interface materials (TIM) in electronic industry. The main goals of the project were: i.) to develop a stable, high speed indium plating process; ii.) to obtain pure indium deposits with a low melting point (] 56°C) and high thermal conductivity (82 W/m-K); iii.) to provide good adhesion to the substrate with a void-free interface.The electrochemical plating bath is based on an acidic electrolyte with copolymer additives. Typical plating conditions are: pH 0.9-].2, current density 0.5-20ASD, temperature 30-60°C and a metal ion concentration of 30-60g/l. Uniform deposit thicknesses of a few microns up to several hundred microns can be achieved at a plating rate of 180 microns per hour at a current density of 10ASD. Good adhesion to standard nickel-plated substrates (no delamination or voids allowed) is critical for meeting the thermal and reliability targets. Adherent, void-free deposits were obtained with thermal conductivity and thermal expansion data that correspond favourably to literature values for the bulk metal.