The Microstructure and Superconducting Properties of Bi,Pb-2223 Thin Film Fabricated by RF Sputtering and Annealing Method

Matsumoto, Akiyoshi; Kitaguchi, Hitoshi; Doi, Toshiya; Kajihara, Takato; Hata, Satoshi

doi:10.1109/tasc.2012.2233856

Cited by 5 publications

(6 citation statements)

References 9 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Furthermore, J c is calculated to be almost independent of the field when the magnetic field is applied parallel to the ab-plane. [28], DI-BSCCO [1], and MOCVD film [2] for comparison.…”

Section: Resultsmentioning

confidence: 99%

Critical current density enhancement of Bi, Pb-2223 thin film fabricated by RF sputtering and post-annealing processes

Matsumoto¹,

Kitaguchi²

2013

Supercond. Sci. Technol.

View full text Add to dashboard Cite

In this study, the microstructures and superconducting properties of Bi, Pb-2223 thin films on SrTiO 3 (100) fabricated by radio-frequency (RF) sputtering and annealing have been investigated. Most of the as-deposited films fabricated by RF sputtering did not exhibit a superconducting transition, due to low crystallinity, deviation from the composition of Bi-2223, and low intergrain connectivity. The as-deposited films did not contain Pb. To obtain the Bi, Pb-2223 phase, we annealed the film with Bi, Pb-2223 pellets and powder. After annealing, we confirmed that the thin film contained Pb. A zero-resistance transition temperature of 100 K was obtained in the Bi, Pb-2223 thin film after post-annealing. We observed strong 00l peaks and a sharp quadrupole in x-ray θ -2θ and φ-scan measurements. These results suggested that this film consists of a single phase of Bi, Pb-2223 and has a biaxial orientation. The Bi, Pb-2223 thin film had a maximum critical current density of 0.9 × 10 5 A cm −2 at 77 K in a self-field. Furthermore, Bi, Pb-2223 exhibited very strong anisotropy in its critical current density-magnetic field angle characteristics.

show abstract

“…Furthermore, J c is calculated to be almost independent of the field when the magnetic field is applied parallel to the ab-plane. [28], DI-BSCCO [1], and MOCVD film [2] for comparison.…”

Section: Resultsmentioning

confidence: 99%

Critical current density enhancement of Bi, Pb-2223 thin film fabricated by RF sputtering and post-annealing processes

Matsumoto¹,

Kitaguchi²

2013

Supercond. Sci. Technol.

View full text Add to dashboard Cite

show abstract

“…6; further, the grain connectivity was also low even if only a single Bi-2223 phase was formed. In comparison, temperatures in excess of 850 • C resulted in the J c exceeding 1.0 × 10 5 A/cm 2 , reaching a maximum of 3.3 × 10 5 A/cm 2 at 858 • C. Although these values are still low when compared with those obtained by Endo et al, they are nevertheless sufficiently high for a first trial of Bi,Pb-2223 thin films [28]. Furthermore, these values are much higher than those of tape conductors, despite the similarity in surface morphology identified in the SEM analysis.…”

Section: Resultsmentioning

confidence: 53%

“…Previous reports have demonstrated that Bi,Pb-2223 thin films with a T c = 101 K and J c = 1.0 × 10 4 at 78 K in a magnetic field of 2 T are possible and that these J c values are almost equal to those of tape conductors. Other studies of Bi-2223 thin films have reported J c values of over 2.0 × 10 5 A/cm 2 at 77 K, which are in fact much higher than those obtained with tape conductors [28]. The fabrication of Bi,Pb-2223 thin films with very high J c (∼10 6 A/cm 2 at 77 K in a self-field) and zero-resistance T c (typically around 100 K) has also 00been achieved through a refined three-step (deposition + annealing + post-annealing) process [29].…”

Section: Introductionmentioning

confidence: 70%

Effect of Annealing DC-Sputtered Bi,Pb-2223 Thin Films

Matsumoto

Kitaguchi

Doi

et al. 2015

IEEE Trans. Appl. Supercond.

Self Cite

View full text Add to dashboard Cite

Thin films of Bi-2223 fabricated on SrTiO 3 (100) substrates by dc sputtering were found to have a transition temperature (T c ) as low as that of bulk-phase Bi-2223. Subsequent annealing of these precursor films in the presence of Bi,Pb-2223 pellets increased this T c value from 72 to 105 K, making it comparable to bulk-phase Bi,Pb-2223. Strong (00l) peaks and a sharp quadrupole were observed in this annealed film, indicating a main phase of Bi,Pb-2223 with a c-axis orientation by the X-ray diffractometry (XRD) measurements. A maximum critical current density (J c ) of 3.3 × 10 5 A/cm 2 at 77 K was also obtained with the Bi,Pb-2223 thin film, which is a value that is much higher than that of commercial Bi,Pb-2223 tapes. J c values of thin films were strongly dependent on the annealing temperatures between 854 • C and 866 • C. In this temperature range, XRD data show that the thin films were not a single phase of Bi,Pb-2223, suggesting only a slight interruption of the supercurrent. Although, the films have a good c-axis and ab-axis alignments. Thus, although the films were not perfect, the improvement in microstructure allows for a much higher J c value.

show abstract

“…Although the J c of the optimal sample in this study was similar to that of the Bi-2223 filament in commercial tapes [9], more research work is needed to improve the thin film performance, because the J c of 0.06 MA cm −2 (77 K, selffield) was much lower than that of (Bi, Pb)-2223 thin films fabricated via vacuum methods such as CVD [19] and sputtering [21,22]. As suggested in figures 1-5, there is still a lot of room to improve the surface quality, microstructure, and phase fraction of the thin films obtained via CSD.…”

Section: Discussionmentioning

confidence: 87%

“…Bi-2223 thin films on SrTiO 3 substrates were fabricated by using the PLD method in the study of Mua et al and a J c of 6.2 MA cm −2 (20 K, 0.5 T) was achieved [20]. Matsumoto et al utilized sputtering and post-annealing processes to fabricate Bi-2223 thin films on SrTiO 3 substrates, and the maximum J c was 0.09 MA cm −2 (77 K, self-field) [21,22]. The fabrication of Bi-2223 thin films by using the CSD method, which has a low-cost advantage relative to the above vacuum methods, is rarely found in the literature.…”

Section: Introductionmentioning

confidence: 99%

Biaxially textured (Bi, Pb)₂Sr₂Ca₂Cu₃O_x thin films on LaAlO₃ substrates fabricated via the chemical solution deposition method

Lin

Feng

et al. 2019

Supercond. Sci. Technol.

View full text Add to dashboard Cite

In this study, biaxially textured (Bi, Pb)2Sr2Ca2Cu3Ox ((Bi, Pb)-2223) thin films were fabricated epitaxially on LaAlO3 (LAO) single crystal substrates via the chemical solution deposition (CSD) method. In order to prevent the evaporation of Bi and Pb, a sealed face-to-face architecture for sintering was utilized. According to the results of x-ray diffraction measurements including θ/2θ-scan, ω-scan, and ϕ-scan patterns, the optimal sintering temperature was found to be 840 °C. The volume fraction of the (Bi, Pb)-2223 phase of the optimal sample was enhanced to above 80%. Favorable out-of-plane and in-plane textures were also detected, which could be attributed to an epitaxy system of (Bi, Pb)-2223 thin film and an LAO substrate with a 45° rotated alignment. A dense microstructure and thickness of about 100 nm were found by scanning electron microscopy observations of the surface morphology and cross section. The critical temperature of the optimal sample determined with the four-probe method was 103.2 K, and its critical current density values were 0.06 MA cm−2 (77 K, self-field) and 1.91 MA cm−2 (4.2 K, self-field), which were obtained by AC susceptibility measurement and a superconducting quantum interference device, respectively. This study demonstrated the feasibility of fabricating (Bi, Pb)-2223 thin films with superconducting performance via the low-cost CSD method.

show abstract

The Microstructure and Superconducting Properties of Bi,Pb-2223 Thin Film Fabricated by RF Sputtering and Annealing Method

Cited by 5 publications

References 9 publications

Critical current density enhancement of Bi, Pb-2223 thin film fabricated by RF sputtering and post-annealing processes

Critical current density enhancement of Bi, Pb-2223 thin film fabricated by RF sputtering and post-annealing processes

Effect of Annealing DC-Sputtered Bi,Pb-2223 Thin Films

Biaxially textured (Bi, Pb)₂Sr₂Ca₂Cu₃O_x thin films on LaAlO₃ substrates fabricated via the chemical solution deposition method

Contact Info

Product

Resources

About

The Microstructure and Superconducting Properties of Bi,Pb-2223 Thin Film Fabricated by RF Sputtering and Annealing Method

Cited by 5 publications

References 9 publications

Critical current density enhancement of Bi, Pb-2223 thin film fabricated by RF sputtering and post-annealing processes

Critical current density enhancement of Bi, Pb-2223 thin film fabricated by RF sputtering and post-annealing processes

Effect of Annealing DC-Sputtered Bi,Pb-2223 Thin Films

Biaxially textured (Bi, Pb)2Sr2Ca2Cu3O x thin films on LaAlO3 substrates fabricated via the chemical solution deposition method

Contact Info

Product

Resources

About

Biaxially textured (Bi, Pb)₂Sr₂Ca₂Cu₃O_x thin films on LaAlO₃ substrates fabricated via the chemical solution deposition method