The Native Oxide Effects on the Optical Properties of TbFe2

Lee, S.J.; Song, Chao

doi:10.1002/1521-396x(200108)186:3<487::aid-pssa487>3.0.co;2-q

Cited by 1 publication

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“…It has been shown that as the thickness of the oxide layer is reduced, the magnitude of the optical conductivity increases and the features in the optical conductivity spectrum become more prominent. 8 The dc resistivity results for all films in the series are shown in Fig. 6.…”

Section: Resultsmentioning

confidence: 99%

Influence of nanostructure and nitrogen content on the optical and electrical properties of reactively sputtered FeSiAl(N) films

Lee

Snyder

et al. 2003

Journal of Applied Physics

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In this study, the optical properties and dc resistivity of a series of FeSiAl(N) films reactively sputtered with different partial pressures of N were investigated. Spectroscopic ellipsometry was used to measure the real and imaginary parts of the complex dielectric functions. There is a distinct micro/nanostructural transition from single-phase columnar body-centered-cubic (bcc) grains for partial pressure (pp) of nitrogen in sputtering gas ⩽4% to a two-phase nanocomposite of equiaxed bcc nanograins in an amorphous matrix for filmsdeposited with ⩾5% pp N. To assess the effect of surface oxidation on the optical properties, optical measurements were repeated on the 2 and 5% pp N films (representative of the two different types of films with different structures) after they were sputter etched in situ while performing depth profiling of the chemical composition using x-ray photoelectron spectroscopy. The low-nitrogen films(⩽4% pp N) showed a dielectric function typical of a metal whose charge carrier contribution can be described by a classical free electron Drude model. The nanostructured films(⩾5% pp N) showed a positive real part of the dielectric functionε1and no evidence of free-carrier plasmon excitation. The optical conductivity decreased and the dc resistivity increased by about a factor of 2.5 as the film structure changed from a single phase columnar structure to the two-phase material that consisted of nanograins in an amorphous matrix. In this study, the optical properties and dc resistivity of a series of FeSiAl͑N͒ films reactively sputtered with different partial pressures of N were investigated. Spectroscopic ellipsometry was used to measure the real and imaginary parts of the complex dielectric functions. There is a distinct micro/nanostructural transition from single-phase columnar body-centered-cubic ͑bcc͒ grains for partial pressure ͑pp͒ of nitrogen in sputtering gas р4% to a two-phase nanocomposite of equiaxed bcc nanograins in an amorphous matrix for films deposited with у5% pp N. To assess the effect of surface oxidation on the optical properties, optical measurements were repeated on the 2 and 5% pp N films ͑representative of the two different types of films with different structures͒ after they were sputter etched in situ while performing depth profiling of the chemical composition using x-ray photoelectron spectroscopy. The low-nitrogen films ͑р4% pp N͒ showed a dielectric function typical of a metal whose charge carrier contribution can be described by a classical free electron Drude model. The nanostructured films ͑у5% pp N͒ showed a positive real part of the dielectric function 1 and no evidence of free-carrier plasmon excitation. The optical conductivity decreased and the dc resistivity increased by about a factor of 2.5 as the film structure changed from a single phase columnar structure to the two-phase material that consisted of nanograins in an amorphous matrix.

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Section: Resultsmentioning

confidence: 99%