The nitriding of aluminium by dense plasma focus

Sadiq, Muhammad; Ahmad, Shamim; Waheed, A.; Zakaullah, M.

doi:10.1088/0963-0252/15/3/001

Cited by 29 publications

(22 citation statements)

References 39 publications

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“…This device is a potential candidate for soft and hard X-rays, neutrons, relativistic electrons and energetic ions irradiation [4,5]. These energetic ions have been utilized for different applications such as thin film deposition [6][7][8], thermal surface treatment [9], phase change of thin films [10] and ion implantation [11][12][13] in some studies.…”

Section: Introductionmentioning

confidence: 99%

Investigation of Effective Parameters on Metal Nitride Deposition by Plasma Focus Device: Number of Shots and Substrate Axial and Angular Positions

et al. 2015

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Plasma focus (PF) technique is potentially promising candidate for the materials processing and surface modification because of the radiations in a wide range of energies. In this review paper, we discuss and report the use of PF device for transition hard metal nitrides thin film synthesis and investigation of some effective deposition parameters in PF. In this paper, we focus on tungsten nitride film, which has promising industrial and scientific applications. A systematic study has been performed to investigate the effect of the number of focus shots and substrate axial and angular positions on the physical properties of tungsten nitride film deposited by PF device. It is indicated that these parameters are effective in order to obtain good quality tungsten nitride film and estimating the optimum conditions for growing these films with desired physical properties.

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Section: Introductionmentioning

confidence: 99%

Investigation of Effective Parameters on Metal Nitride Deposition by Plasma Focus Device: Number of Shots and Substrate Axial and Angular Positions

et al. 2015

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“…As a result, improving their surface properties is very crucial for industrial applications. Sadiq et al [7] conducted an experimental study on the nitriding of aluminium by energetic ion streams emitted from 1.8 kJ plasma focus device. Habibi et al [8] studied interaction of deuteron ion irradiation of Al samples by Dena filippov type plasma focus device.…”

Section: Introductionmentioning

confidence: 99%

Study of Dense Nitrogen Plasma Irradiation of Aluminum Targets by APF Plasma Focus Device

Afrashteh

Habibi

2011

J Fusion Energ

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The nitridation of Al surfaces is obtained by irradiating nitrogen ions from APF device. The Vickers Micro-Hardness values are improved approximately three times for the nitrided samples comparing to the non-nitrided ones. The X-ray diffraction analysis is carried out in order to explore the phase changes in the near surface structure of the metals. The Nuclear Reaction Analysis shows the depth of the nitride composed on the metal surfaces clearly and quantitatively. The results of Scanning Electron Microscopy indicate changes in surface morphology which are the emergence of a smooth and uniform film scattered on the surface of the nitrided specimens.

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“…[1][2][3][4][5][6][7] Due to its simplicity, versatility, compactness, cost-effectiveness, and easy maintenance, PF is particularly attractive for both basic and applied research. An important part of the recent experimental studies on x-ray and particle emission from PF is oriented in interesting applications such as contact microscopy, x-ray and electron beam lithography, generation of soft x-ray spectral lines of highly charged heavy metal ions, metal coating by ion sputtering, surface modification and deposition of thin films, x-ray backlighting, radiography of biological and mechanical objects, and micromachining.…”

Section: Introductionmentioning

confidence: 99%

Effect of insulator sleeve material on the x-ray emission from a plasma focus device

et al. 2010

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The effect of insulator sleeve material on x-ray emission from a 2.3 kJ Mather type plasma focus device operated in argon-hydrogen mixture is investigated. The time and space resolved x-ray emission characteristics are studied by using a three channel p-i-n diode x-ray spectrometer and a multipinhole camera. The x-ray emission depends on the volumetric ratio of argon-hydrogen mixture as well as the filling pressure and the highest x-ray emission is observed for a volumetric ratio 40% Ar to 60% H 2 at 2.5 mbar filling pressure. The fused silica insulator sleeve produces the highest x-ray emission whereas nonceramic insulator sleeves such as nylon, Perspex, or Teflon does not produce focus or x-rays. The pinhole images of the x-ray emitting zones reveal that the contribution of the Cu K␣ line is weak and plasma x-rays are intense. The highest plasma electron temperature is estimated to be 3.3 and 3.6 keV for Pyrex glass and fused silica insulator sleeves, respectively. It is speculated that the higher surface resistivity of fused silica is responsible for enhanced x-ray emission and plasma electron temperature.

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The nitriding of aluminium by dense plasma focus

Cited by 29 publications

References 39 publications

Investigation of Effective Parameters on Metal Nitride Deposition by Plasma Focus Device: Number of Shots and Substrate Axial and Angular Positions

Investigation of Effective Parameters on Metal Nitride Deposition by Plasma Focus Device: Number of Shots and Substrate Axial and Angular Positions

Study of Dense Nitrogen Plasma Irradiation of Aluminum Targets by APF Plasma Focus Device

Effect of insulator sleeve material on the x-ray emission from a plasma focus device

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