The optical properties of sputtered Co3O4 films

Preparation of oriented CoO(001) films on MgO(001) by sol–gel two-steps method

“…It was used in solar thermal energy collectors as selective absorbing layers [1], electrochromic, smart windows, variable reflectance mirrors, and semiconductorbased sensors [2]. A number of techniques have been developed for fabrication of cobalt oxide thin films such as sputtering [3], chemical vapor deposition [1], spray pyrolysis [4], dip-coating [5], and chemical bath deposition [6]. Strongly oriented thin films of Co 3 O 4 on single-crystal MgO (0 0 1) have been deposited by low-pressure, lowtemperature MOCVD [7,8].…”

Nanostructured black cobalt coatings for solar absorbers

“…[6,7] Because of its optical, semiconducting, magnetic, and electrochemical properties, black cobalt (cobalt oxide) is a promising material among transition metal oxides, which render it attractive for solar photochemical applications and electrochemical devices as a counter electrode. [8,9] Recently, several techniques have been developed to deposit black cobalt as sputtering, [10] sol-gel, [11] chemical vapor deposition, [12] and electrochemical deposition. [13] In the present work, a simple chemical process of nanoblackening cobalt electrodeposition to provide high absorption coating was described.…”

Atomic Layer Deposition of Co3O4 Thin Films Using a CoI2/O2 Precursor Combination

“…The other thermodynamically stable oxide is the high temperature phase CoO which crystallizes in a rock salt structure. Thin films of Co 3 O 4 have been deposited using a wide variety of deposition methods such as reactive electron-beam evaporation, [1] sputtering, [7,11] pulsed laser deposition, [12] electrodeposition, [3,13] spray pyrolysis, [2,5,14] sol-gel processes, [15] various modes of CVD, [6,[16][17][18] and ALD from metal-organic precursors. [19] The ALD technique might be regarded as a pulsed-CVD technique, where the precursors are introduced, separated in time and space, and then the film growth is achieved through selflimiting surface reactions.…”