2017
DOI: 10.1088/1674-1056/26/11/117101
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The p-type ZnO thin films obtained by a reversed substitution doping method of thermal oxidation of Zn 3 N 2 precursors

Abstract: P-type ZnO is crucial for the realization of ZnO-based homojunction ultraviolet optoelectronic devices. The problem associated with the preparation of stable p-type ZnO with high hole density still hinders device applications. In this paper, we introduce an alternative route to stabilizing N in the oxidation process, the thermal stability of p-ZnO is significantly improved. Finally, we discuss the limitations of the alternative doping method and provide some prospective outlook of the method.

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Cited by 10 publications
(9 citation statements)
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“…All measured samples show optical band-gap energies between 1.05 and 1.37 eV, being in agreement with most of the previous literature. 10,15,[25][26][27][28][29][30][31][32][33][34][35][36][37][38] Burstein and Moss 43,44 described the influence of the carrier concentration in semiconductors on their optical band-gap. The displacement of the Fermi level into a parabolic conduction band leads to a band-gap shift according to (8) where denotes the electron concentration.…”
Section: E Optical Properties Of Zn 3 Nmentioning
confidence: 99%
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“…All measured samples show optical band-gap energies between 1.05 and 1.37 eV, being in agreement with most of the previous literature. 10,15,[25][26][27][28][29][30][31][32][33][34][35][36][37][38] Burstein and Moss 43,44 described the influence of the carrier concentration in semiconductors on their optical band-gap. The displacement of the Fermi level into a parabolic conduction band leads to a band-gap shift according to (8) where denotes the electron concentration.…”
Section: E Optical Properties Of Zn 3 Nmentioning
confidence: 99%
“…In the 2000s, the II-nitride material Zn 3 N 2 got into the focus of research, because of the strong interest to fabricate p-type doped ZnO, which would have led to a breakthrough in ZnO-based optoelectronic devices. In this context, several attempts were made to achieve p-ZnO by (partial) oxidation of Zn 3 N 2 [4][5][6][7][8][9][10][11][12] or by fabricating ZnO:N from Zn 3 N 2 targets, as demonstrated by pulsed laser ablation. 13 This also led to increased research activity on Zn 3 N 2 itself, including first demonstrations of Zn 3 N 2 in the field of thin film transistors (TFTs).…”
Section: Introductionmentioning
confidence: 99%
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“…Due to the low solid solubility of N in ZnO, many researchers have obtained p-N:ZnO by thermal oxidizing Zn 3 N 2 , , which can incorporate a high concentration of N into ZnO. When Zn 3 N 2 is oxidized in an ordinary O 2 atmosphere, there are still a lot of oxygen vacancies in ZnO.…”
Section: Increasing the Acceptor Concentrationmentioning
confidence: 99%
“…The generation of the surface species can be explained by the mechanism below. ZnO is intrinsically an n-type semiconducting material, that when doped with nitrogen, is found to generate more p-type charge carriers [29,31,49]. The native defects in ZnO include both donor like and acceptor like defects.…”
Section: Electrochemical Mechanism For Ph Detectionmentioning
confidence: 99%