Highly vibrationally excited fluoroethane and 1,1,1-trifluoroethane molecules were generated by combination of CH2F and CF3 radicals with CHS. The radicals were produced by cophotolysis of acetone and 1,3-difluoroacetone and by photolysis of trifluoroazomethane. The nonequilibrium unimolecular rate constant for HF elimination from CH3CH2F* was measured using the acetone mixture as the bath gas. The rate constants for CH3CF3* were measured with C2F6, CH3N2CF3, c-C4F8, C6Fi4, and C8Fi8 as bath gases. RRKM calculations were done using a four-centered activated complex model and currently favored thermochemical values; good agreement was found between the calculated and both thermal and chemical activation rate constants for CH3CH2F. For the high Z>(CH3-CF3) value of ~99 kcal mol-1, the chemical activation data support a high threshold energy, 68 ± 2 kcal mol-1, for HF elimination from CH3CF3. RRKM calculations for the dissociation reactions of CH3CF3* and CH3CH2F* indicate that radical dissociation should compete with HF elimination at energies near 110 kcal mol-1. The low pressure data for CH8CF3* were analyzed according to a cascade stepladder deactivation model to obtain estimates of the average energy lost per collision. An upper limit of 10-12 kcal mol-1 is implied for even the larger bath gas molecules.