The plasma pretreatment influence on corrosion behavior of Ion Vapor Deposition (IVD) of aluminum coating

Abstract

Purpose The purpose of this study is to investigate the effect of plasma pretreatment on the corrosion and adhesion behavior of Al coating deposited on iron steel by ion vapor deposition (IVD). Design/methodology/approach Ar plasma sputtering was carried out for 0, 5, 10 and 15 min, and then IVD Al coating was performed. Surface free energy measurements were conducted on the plasma-sputtered surfaces. Cross-sectional observations were carried out on the coating/substrate interface by using scanning electron microscopy. Corrosion resistance of the deposited films was characterized using potentiodynamic polarization curve test and electrochemical impedance spectroscopy (EIS). Findings Results demonstrated that surface free energy values were increased by increasing the sputtering time before coating process. The corrosion current density of the IVD Al coating deposited after 15 min Ar plasma pretreatment is three orders of magnitude lower than that of steel ST37 substrate. The EIS tests confirm the excellent anticorrosive properties of the Al-coated specimens. Originality/value With the increase in the plasma pretreatment time, coating adhesion would ameliorate because of the presence of plasma, which makes substrates a better place for Al ions to set and prevent any gap between coatings and substrates. This fact can be attributed to an increase in the surface free energy and reduction of contact angle of substrate exposed to plasma pre-treatment.