2014
DOI: 10.1007/s10845-014-0893-8
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The preparation of organic light-emitting diode encapsulation barrier layer by low-temperature plasma-enhanced chemical vapor deposition: a study on the $$\hbox {SiO}_\mathrm{x}\hbox {N}_\mathrm{y}$$ SiO x N y film parameter optimization

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Cited by 8 publications
(11 citation statements)
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“…Table 8 shows the ANOVA for the MI, where the definitions of the degree of freedom (DOF), sum of square (SS), mean square (MS), F -ratio, and contribution can be found from the ANOVA. 12…”
Section: Resultsmentioning
confidence: 99%
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“…Table 8 shows the ANOVA for the MI, where the definitions of the degree of freedom (DOF), sum of square (SS), mean square (MS), F -ratio, and contribution can be found from the ANOVA. 12…”
Section: Resultsmentioning
confidence: 99%
“…The two objective function equations of the S/N ratio used herein are expressed as follows. 12 1. Nominal the Best (NTB)…”
Section: Quality Engineering Theory Taguchi Methodsmentioning
confidence: 99%
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“…While the Taguchi method is mainly used for optimizing single quality property (Kuo et al 2013;Kuo and Lan 2014;Zainal et al 2013), optimal processing parameters that determine the single quality do not represent the optimization of process parameters for the overall quality. For this reason, Taguchi method should be combined with other methods.…”
Section: Introductionmentioning
confidence: 99%