The preparation of thin films of some oxides by the pyrolysis method

Thulium and Ytterbium-Doped Titanium Oxide Thin Films Deposited by Ultrasonic Spray Pyrolysis

“…All these precursors were purchased from STREM Chemicals Inc (Bischheim, France) and butanol was purchased from Alfa Aesar GmbH (Schiltigheim, France). Precursors were selected for non-toxicity, good stability at room temperature, easy handling, high volatility and low cost [24]. The films were deposited on (100) silicon substrate.…”

Temperature dependence of growth orientation and surface morphology of Li‐doped ZnO thin films on SiO2/Si substrates

“…This is could be due to an enlargement of the grains and indicating improvement of the crystal quality with increasing temperature. It is known that vacuum deposited films at lower substrate temperatures have very small grain sizes while those deposited at higher substrate temperatures have larger grain sizes [12][13][14][15][16][17][18][19][20][21][22][23][24]. The grain size distribution of the obtained samples against temperature is given in table 2.…”

“…It was confirmed that Li increases the resistivity of ZnO and induces a ferroelectric phase suitable for memory devices. Different methods have been used to deposit ZnO thin films, for example radio frequency magnetic sputtering [10][11][12], chemical vapor deposition [13,14], spraying [15][16][17], sol-gel [18][19][20][21].…”

Inorganic Materials Integrated Optics

“…The layers appear black-grey and absorb in the visible wavelength range 25 .Chromium doped waveguides were deposited at sublimation temperatures between 75°C and 129°C with an argon carrier gas flow of 1.1 sccm. The layers appear black-grey and absorb in the visible wavelength range 25 .Chromium doped waveguides were deposited at sublimation temperatures between 75°C and 129°C with an argon carrier gas flow of 1.1 sccm.…”