The preparation of TiO2 thick film anodes for photoelectrochemical solar cells

Blaauw, C.; Naguib, H. M.; Ahmad, Aftab; Ahmed, S. M.

doi:10.1016/0165-1633(82)90008-9

Solar Energy Materials

1982

DOI: 10.1016/0165-1633(82)90008-9

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The preparation of TiO2 thick film anodes for photoelectrochemical solar cells

C. Blaauw

H. M. Naguib

Aftab Ahmad

et al.

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1985

1986

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Cited by 3 publications

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“…Polycrystalline n-TiO~ has been largely studied as a semiconducting electrode in photoelectrochemical cells. Several techniques for the preparation of the photoanodes are found in the literature, namely, thermal oxidation (1)(2)(3)(4)(5)(6)(7)(8), anodic oxidation (8)(9)(10)(11)(12)(13)(14)(15)(16), chemical vapor deposition (8,9,14,(17)(18)(19)(20)(21) and plasma-enhanced chemical vapor deposition (22), sputtering (23,24), pressed and sintered powders (2,25,26), and screen printing (27).…”

mentioning

confidence: 99%

Plasma‐Sprayed Semiconductor Electrodes: Photoelectrochemical Properties of TiO2

Parent

Dodelet

Ross

et al. 1985

J. Electrochem. Soc.

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TiO2 photoanodes have been prepared by the plasma spray technique on titanium, graphite, and alumina substrates. 25–30 μm thick coatings display a good adhesion to the substrate and a highly textured surface. Dark and photoelectrochemical properties of the photoanodes have been measured in oxygen‐saturated solutions of normalNaOH at pH 13. It is shown that the performances of the electrodes are quite insensitive to the plasma power or to the TiO2 powder granulation but are very sensitive to the purity of the spraying material, to the substrate, and also to a heat‐treatment ( H2 or Ar at 800°C followed by a rapid quenching in air). The maximum quantum yield is obtained at 300 nm for heat‐treated TiO2 . It is about 40% on alumina and 70% on the titanium. The heat‐treatment affects the conductivity, σ, and the surface density of hydroxyl groups, NOH , of the coatings. For heat‐treated TiO2 , typical values are σ=2.4 false(normalΩ‐normalcm)−1 and NOH=2.8×1015 cm−2 . For untreated TiO2 , typical values are σ=30.6 false(normalΩ‐normalcm)−1 and NOH=2.1×1016 cm−2 . The J‐V curves of heat‐treated TiO2 sprayed on alumina extend anodically up to 9.5V (vs. SCE), where film breakdown occurs. For the same film sprayed on titanium and graphite, the anodic dark behavior is similar to that observed for the bare substrates. It is concluded that polycrystalline TiO2 coatings, produced by the plasma spray technique, can display photoelectrochemical and dark characteristics similar to the ones obtained with single‐crystal material.

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mentioning

confidence: 99%

Plasma‐Sprayed Semiconductor Electrodes: Photoelectrochemical Properties of TiO2

Parent

Dodelet

Ross

et al. 1985

J. Electrochem. Soc.

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6. Titanium

Jamieson¹,

Serpone²,

Pelizzetti³

1986

Coordination Chemistry Reviews

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Preparation and protoelectrochemical properties of TiO2 thin binder layers

Kochev

1985

Solar Energy Materials

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The preparation of TiO2 thick film anodes for photoelectrochemical solar cells

Cited by 3 publications

References 19 publications

Plasma‐Sprayed Semiconductor Electrodes: Photoelectrochemical Properties of TiO2

Plasma‐Sprayed Semiconductor Electrodes: Photoelectrochemical Properties of TiO2

6. Titanium

Preparation and protoelectrochemical properties of TiO2 thin binder layers

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