The production of a novel stain-etched porous silicon, metallization of the porous surface and application in hydrocarbon sensors

Parbukov, A. N.; Beklemyshev, V. I.; Gontar, V. M.; Makhonin, I. I.; Гаврилов, С. А.; Bayliss, S. C.

doi:10.1016/s0928-4931(01)00258-2

Cited by 30 publications

(16 citation statements)

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“…Experiments performed by the authors showed that the catalytic activity of Pd-doped porous silicon is enhanced by about one order of magnitude at 160 C and for 1% hydrogen concentration, compared to that of uniform Pd layers, 8 nm thick, deposited directly on silicon surface. This means that the rate of heat production, due to the catalytic reaction is also enhanced, as has been observed experimentally [11]. This shows the interest to use PS as a matrix for the inclusion of the catalytic material.…”

Section: Estimation Of the Catalytic Activitysupporting

confidence: 66%

Hydrogen catalytic oxidation reaction on Pd-doped porous silicon

et al. 2002

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The efficiency of Pd-doped porous silicon (PS) as a catalytic material for hydrogen sensing is studied. Pd is deposited by an electroless process on the internal surface of porous silicon. The catalytic behavior of Pd-doped PS samples is estimated and the parameters that influence the kinetics of the chemical reaction are evaluated. The catalytic activity is examined through the kinetics of the chemical reaction, which occurs in low hydrogen content mixtures with air (up to 1% v/v in air), far below the mixture flammability limit. It was found that the catalytic activity of Pd-doped porous silicon at 160 C is significantly higher than that of a planar surface covered with Pd. The dependence of the catalytic activity on processing conditions was also evaluated. These results open important new possibilities for applications in gas sensors.

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Section: Estimation Of the Catalytic Activitysupporting

confidence: 66%

Hydrogen catalytic oxidation reaction on Pd-doped porous silicon

et al. 2002

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“…The increased reactivity is due to the porous structure and the increased internal surface of the Pd-doped PS film. Such a behavior has been observed experimentally [12].…”

Section: Cross Sectional Tem Micrograph Of a Pd-doped Ps Layer Aftesupporting

confidence: 62%

“…For that reason PS films constitute an ideal matrix for the inclusion of catalytic materials. Chemical sensors using PS layers have been reported, which operate at room or at higher temperatures [8][9][10][11][12]. Their operation is based either on the change of PS resistance when the material is exposed to a gas atmosphere, or on the detection of heat produced from combustion of a combustible gas on the surface of PS.…”

Section: Introductionmentioning

confidence: 99%

Porous Silicon for Chemical Sensors

Tsamis

Nassiopoulou

Frontiers of Multifunctional Integrated Nanosystems

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Abstract.In this work we highlight the advantages of using Porous Silicon (PS) as a material for chemical sensors. Two different applications of PS are investigated: (a) as a matrix for the inclusion of catalytic materials, such as Pd or Pt, and (b) as a material for the fabrication of suspended micro hotplates, for improved thermal isolation. For the first application, the catalytic behavior of Pd-doped PS samples is estimated and the parameters that influence the kinetics of the chemical reaction are evaluated. It is found that the catalytic activity of Pd-doped porous silicon is significantly higher than that of a planar surface covered with Pd. On the other hand, the effectiveness of PS for local thermal isolation on a silicon substrate is examined and the thermal properties of suspended porous silicon (PS) micro-hotplates are investigated. The micro-hotplates are fabricated by a novel technique, based on the isotropic etching of silicon under a PS layer, in a high density plasma reactor. Very high local temperatures on the micro-hotplates (higher than 600 o C) with very low power consumption (only a few tens of mW) have been obtained, due to the very low thermal conductivity of PS, which is comparable to that of thermal oxide and it is much lower than that of silicon nitride, typically used for thermal sensor applications.

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“…Electroless etching has been widely used for the micro-and nanostructuring of planar silicon substrates, resulting in a roughened surface containing pits or porous structures [25,26]. Such surfaces have been exploited for their highly exposed area [27,28] and good light absorbing properties due to light trapping [29]. These porous structures contain silicon nanocrystals, which show efficient photoluminescence and electroluminescence, enabling optoelectronic and sensing applications [29][30][31][32][33][34][35][36][37].…”

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confidence: 99%