The Properties of Cr–Co–Cu–Fe–Ni Alloy Films Deposited by Magnetron Sputtering

Shaginyan, L. R.; Britun, V. F.; Krapivka, N. A.; Фирстов, С. А.; Kоtkо, А. V.; Gorban, V. F.

doi:10.1007/s11106-018-9982-0

Cited by 11 publications

(9 citation statements)

References 18 publications

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“…A few groups have sputtered the same HEA at room temperature, and reported [31][32][33][34][35] a single fcc solid solution as we observed. Shaginyan et al 30 reported that their CrFeCoNiCu films This is the author's peer reviewed, accepted manuscript. However, the online version of record will be different from this version once it has been copyedited and typeset.…”

Section: Comparison With Structure Observed By Othersmentioning

confidence: 99%

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High entropy alloy CrFeNiCoCu sputter deposited films: Structure, electrical properties, and oxidation

Mayandi

Schrade

Vajeeston

et al. 2022

Journal of Vacuum Science &Amp; Technology A

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High entropy alloy (HEA) films of CrFeCoNiCu were prepared by sputtering. Their structure was characterized and their electric transport properties studied by temperature dependent Hall and Seebeck measurements. The HEA films show a solid solution with fcc structure. The residual electrical resistivity of the films is around 130 μΩcm which is higher than the Mott limit for a metal while the temperature dependence of the resistivity above 30 K is metal-like but with a small temperature coefficient of resistivity (2 ppm/K). The dominant scattering mechanism of charge carriers is alloy scattering due to chemical disorder in the HEA. The Hall coefficient is positive while the Seebeck coefficient is negative. This is interpreted as arising from an electronic structure where the Fermi level passes through band states having both holes and electrons as indicated by the band structure calculations. Below 30 K the conduction is discussed in terms of weak localization-and Kondo-effects. The HEA structure appears stable for annealing in vacuum, while annealing in an oxygen containing atmosphere causes the surface to oxidize and grow a Cr-rich oxide on the surface. This is then accompanied by demixing of the HEA solid solution and a decrease in the effective resistance of the film.

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Section: Comparison With Structure Observed By Othersmentioning

confidence: 99%

“…experimental equipment and its condition can make differences. Shaginyan et al 30 have reported on sputter deposited CrFeCoNiCu alloys, and observed that their films had a nanocrystalline microstructure and crystallize as a two-phase fcc and bcc solid solutions.…”

Section: Introductionmentioning

confidence: 99%

High entropy alloy CrFeNiCoCu sputter deposited films: Structure, electrical properties, and oxidation

Mayandi

Schrade

Vajeeston

et al. 2022

Journal of Vacuum Science &Amp; Technology A

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“…Three different zones have been identified: zone I where Ts<<Tm and the formation of narrow grains due to low diffusion, zone II where Ts and Tm are closer to each other and large grains can form; and an intermediate zone, zone T in between 1 and 2 where Ts<Tm and competitive growth can occur. For CoCrFeNi thin films, columnar growth is recurrent in literature [45][46][47][48]61,62,66], and some have identified zone T at low temperatures (T<500°C) [45,47] and zone II for higher temperatures (T=900°C) [45].…”

Section: Growth Models For Thin Filmsmentioning

confidence: 99%

“…Altering the formation of these initial layers can be done by several means, the most common ones are based on how to increase or decrease surface diffusion of adatoms. Increasing the substrate temperature usually increases the surface diffusion of adatoms and they can form larger clusters which results into larger grains, for CoCrFeNi commonly from 50 nm to 100 nm in width [45,61,62]. Crystal orientation and texture also influences the morphology.…”

Section: Growth Models For Thin Filmsmentioning

confidence: 99%

Catalytically active and corrosion resistant cobalt-based thin films

Linder

2022

Linköping Studies in Science and Technology. Licentiate Thesis

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“…This HEA has been reported on in the literature. 1,12,25,29,[32][33][34][35][36][37][38][39][40][41][42][43][44] The crystal structure has been reported to be FCC, either as a solid solution phase with uniform composition, or as two solid solution phases with slightly different compositions. We have observed that sputtered CrFeCoNiCu has a single FCC phase.…”

Section: Introductionmentioning

confidence: 99%

Controlling the Electrical Properties of Reactively Sputtered High Entropy Alloy CrFeNiCoCu Films

Mayandi

Finstad

Stange

et al. 2021

J. Electron. Mater.

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Oxide-containing films were made by reactively sputtering a high-entropy alloy target of CrFeCoNiCu. We report on a wide range of changes to the electrical properties made by different heat treatments in oxidizing and reducing atmospheres, respectively. We combine temperature-dependent Hall effect measurements down to 10 K to study the transport mechanisms and correlate that with structural measurements by x-ray diffraction and scanning electron microscopy. The measured/effective resistivity could be varied between 1.3 × 10−4 Ω cm and 1.2 × 10−3 Ω cm by post-deposition processing. The temperature coefficient of resistivity could be varied between − 1.2 × 10−3 K−1 through 0 and to + 0.7 × 10−3 K−1. The key to the variation is controlling the morphology and topology of the film. The conduction of charge carriers is dominated by the relative contribution of weak localization and alloy scattering by varying the degree of disorder in the metallic high-entropy alloy and its topology.

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The Properties of Cr–Co–Cu–Fe–Ni Alloy Films Deposited by Magnetron Sputtering

Cited by 11 publications

References 18 publications

High entropy alloy CrFeNiCoCu sputter deposited films: Structure, electrical properties, and oxidation

High entropy alloy CrFeNiCoCu sputter deposited films: Structure, electrical properties, and oxidation

Catalytically active and corrosion resistant cobalt-based thin films

Controlling the Electrical Properties of Reactively Sputtered High Entropy Alloy CrFeNiCoCu Films

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