The quality factor of deeply etched quartz resonators : theory and experiments

Leblois, Thérèse; Tellier, C. R.; Bourquin, R.

doi:10.1051/rphysap:01989002409087700

Cited by 8 publications

(3 citation statements)

References 12 publications

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“…In order to quantify the influence of deposited platelets at the functionalized interface of the resonator, the conventional quartz crystal resonators [4] were utilized in a first approach. As the integrated sensor structure is designed for shear wave, the load from the analyte and from the interface deposited platelets can be quantified with the application of 5 MHz shear bulk acoustic wave resonator with known approximation for introduced load [5,6].…”

Section: Methodsmentioning

confidence: 99%

Integration of Microresonant Sensor into a Microfluidic Platform for the Real Time Analysis of Platelets-Collagen Interaction in Flow Condition

et al. 2018

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The contribution focuses on the development of microresonant sensor solution integrated in microfluidic platform for the haemostasis assessment at realistic rheological flow conditions similar to the one in blood vessels. A multi-parameter sensor performs real time analysis of interactions between immobilized collagen and platelets. The detection and characterization of such interactions at controlled flow rates provide information to evaluate the dynamic of each step of primary haemostasis. The microresonant sensor concept was developed and is described in the contribution.

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Section: Methodsmentioning

confidence: 99%

Integration of Microresonant Sensor into a Microfluidic Platform for the Real Time Analysis of Platelets-Collagen Interaction in Flow Condition

et al. 2018

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“…However, the fluorocarbon of CnF 2n+2 , commonly called a teflon polymer, was deposited on the substrate, impeding the etching. Therefore, O 2 was introduced to control the polymerization [7].…”

Section: Dry-etch Process By Using a Dual-frequency High-density Plasmamentioning

confidence: 99%

Wafer-level fabrication of a high-silica v-groove for fiber-optic packaging using deep dry-etching with a dual-frequency high-density plasma

Ha¹,

Heo²,

Choi³

et al. 2015

Journal of the Korean Physical Society

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We developed a procedure for fabricating deep silica v-grooves of about 70 μm for fiber-optic applications by using a deep dry-etching with a dual-frequency high-density plasma source. This procedure has the advantages of sub-micron precision with wafer-level productivity and a high etching speed of 0.7 μm/sec. An electro-plated hard mask as thick as 8 μm that can endure the deep dry-etch was also developed. In particular, the angular inclination of the etched groove was controllable by using the flow of C4F8 gas. A fiber array block was assembled by using a v-groove chip. The location error of the fiber cores in the block was measured to be less than 0.3 μm. This confirms that the dry-etched silica v-grooves can be applied to the packaging of optical devices with wafer-level productivity and high precision. PACS numbers: 52.80.Pi, 52.70.Kz, 82.35.-x

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“…[10][11][12] In parallel, according to the literature, acoustic waves are known not to be attenuated in the case of given surface features of roughness, and on the contrary are highly attenuated for other features. [13][14][15] In this context, our aim is to develop a biosensor, operating in liquid media, with a design allowing the decoupling and a physical separation between the sensitive part * Author to whom correspondence should be addressed. of the sensor and the electronic part, thanks to a lateral field excitation (LFE).…”

Section: Introductionmentioning

confidence: 99%

Micro Structuration of GaAs Surface by Wet Etching: Towards a Specific Surface Behavior

Bienaime

Élie-Caille

Leblois

2012

j nanosci nanotechnol

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Resonant microelectromechanical systems are promising devices for real time and highly sensitive measurements. The sensitivity of such sensors to additional mass loadings which can be increased thanks to the miniaturisation of devices is of prime importance for biological applications. The miniaturisation of structures passes through a photolithographic process and wet chemical etching. So, this paper presents new results on the anisotropic chemical etching of the gallium arsenide (GaAs) crystal used for this application, in several solutions. This paper focuses on the micro/nanostructuration of the sensing surface to increase the sensor sensitivity. Indeed, this active surface will be biofunctionalized to operate in biological liquid media in view of biomolecules detection. Several experimental conditions of etching bath composition, concentration and temperature were examined to obtain a large variety of geometrical surfaces topographies and roughness. According to the orientation dependence of the chemical etching process, the experiments were also performed on various GaAs crystal plates. The bath 1 H3PO4:9 H2O2:1 H2O appeared to be particularly adapted to the fabrication of the GaAs microstructured membrane: indeed, the bath is highly stable, anisotropic, and, as a function of temperature, it allows the production of a large variety of GaAs surface topographies.

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The quality factor of deeply etched quartz resonators : theory and experiments

Cited by 8 publications

References 12 publications

Integration of Microresonant Sensor into a Microfluidic Platform for the Real Time Analysis of Platelets-Collagen Interaction in Flow Condition

Integration of Microresonant Sensor into a Microfluidic Platform for the Real Time Analysis of Platelets-Collagen Interaction in Flow Condition

Wafer-level fabrication of a high-silica v-groove for fiber-optic packaging using deep dry-etching with a dual-frequency high-density plasma

Micro Structuration of GaAs Surface by Wet Etching: Towards a Specific Surface Behavior

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