The relationship of etching behavior and crystal orientation of aluminum doped zinc oxide films

Ding, Jianning; Ye, F.; Yuan, Ningyi; Tan, C.B.; Zhu, Yuanyuan; Ding, Guomin; Chen, Z.H.

doi:10.1016/j.apsusc.2010.08.054

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Cited by 8 publications

(1 citation statement)

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“…Ding et al [17] have reported that the etching rate of ZnO(002) is higher than ZnO(103), which shows that preferential etching of the (002) plane on the samples. Besides that, the polarity of the sample used for etching needs to be taken into consideration because both O-and Zn-terminated ZnO have different etching effects.…”

Section: Introductionmentioning

confidence: 96%

Fabrication of porous ZnO via electrochemical etching using 10wt% potassium hydroxide solution

Ching

Ooi

et al. 2013

Materials Science in Semiconductor Processing

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Section: Introductionmentioning

confidence: 96%

Fabrication of porous ZnO via electrochemical etching using 10wt% potassium hydroxide solution

Ching

Ooi

et al. 2013

Materials Science in Semiconductor Processing

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Chemical Etching of Zinc Oxide for Thin‐Film Silicon Solar Cells

et al. 2011

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Chemical etching is widely applied to texture the surface of sputter-deposited zinc oxide for light scattering in thin-film silicon solar cells. Based on experimental findings from the literature and our own results we propose a model that explains the etching behavior of ZnO depending on the structural material properties and etching agent. All grain boundaries are prone to be etched to a certain threshold, that is defined by the deposition conditions and etching solution. Additionally, several approaches to modify the etching behavior through special preparation and etching steps are provided.

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Facile bottom-up growth of pyramidally textured ZnO:Al films by combined chemical bathing and DC sputtering deposition

Chen

Tan

Yang

et al. 2016

J Mater Sci: Mater Electron

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The relationship of etching behavior and crystal orientation of aluminum doped zinc oxide films

Cited by 8 publications

References 24 publications

Fabrication of porous ZnO via electrochemical etching using 10wt% potassium hydroxide solution

Fabrication of porous ZnO via electrochemical etching using 10wt% potassium hydroxide solution

Chemical Etching of Zinc Oxide for Thin‐Film Silicon Solar Cells

Facile bottom-up growth of pyramidally textured ZnO:Al films by combined chemical bathing and DC sputtering deposition

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